Zobrazeno 1 - 10
of 14
pro vyhledávání: '"Oscar Noordman"'
Autor:
Joost Bekaert, Dirk Jürgens, Gert Streutker, Wilfred Endendijk, J. Verbeeck, Robert John Socha, Andre Engelen, Bert van Drieenhuizen, Daniel Corliss, Melchior Mulder, Anita Bouma, Cas Johannes Petrus Maria Van Nuenen, Greg McIntyre, Bastian Trauter, Oscar Noordman, Joerg Zimmermann, Robert Kazinczi, Bart Laenens, Wim Bouman
Publikováno v:
SPIE Proceedings.
This paper describes the principle and performance of FlexRay, a fully programmable illuminator for high NA immersion systems. Sources can be generated on demand, by manipulating an array of mirrors instead of the traditional way of inserting optical
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::156a83ca3e2ac3da0d5d3302a3f396f2
https://doi.org/10.1117/12.845984
https://doi.org/10.1117/12.845984
Autor:
Christoph Hennerkes, Manfred Maul, Jens Timo Neumann, Jörg Zimmermann, Sean Park, Joep de Vocht, Paul Gräupner, Michael Patra, Melchior Mulder, Oscar Noordman, Bernd Geh, Dirk Jürgens, Andre Engelen, Dirk Hellweg
Publikováno v:
SPIE Proceedings.
The application of customized and freeform illumination source shapes is a key enabler for continued shrink using 193 nm water based immersion lithography at the maximum possible NA of 1.35. In this paper we present the capabilities of the DOE based
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4f4932bc74e55b1768c513cf20e0a5be
https://doi.org/10.1117/12.847282
https://doi.org/10.1117/12.847282
Autor:
Melchior Mulder, Bert van Drieenhuizen, Stephen Hsu, Michael Patra, András G. Major, Dirk Jürgens, Keith Gronlund, Oscar Noordman, Johannes Eisenmenger, Markus Degünther, Robert Kazinczi, Gert Streutker, Andre Engelen
Publikováno v:
SPIE Proceedings.
This paper describes the principle and performance of a fully programmable illuminator for a high-NA immersion system. Sources can be generated on demand, by manipulating an array of mirrors instead of the traditional way of inserting optical element
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2c21d3566eade6a24a218673676d0051
https://doi.org/10.1117/12.837035
https://doi.org/10.1117/12.837035
Autor:
James G. Tsacoyeanes, Gary Politi, Manfred Maul, Vladan Blahnik, Jan Baselmans, Michael Patra, A. S. Tychkov, Oscar Noordman
Publikováno v:
SPIE Proceedings.
In recent years the topic of speckle in optical projection microlithography received increasing interest because of its potential contribution to line width roughness (LWR). Speckle is a light interference effect that causes the dose delivered to the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2544b1d51068b9e28034d982eb95f91c
https://doi.org/10.1117/12.814169
https://doi.org/10.1117/12.814169
Autor:
Tom Hoogenboom, Hans Van Der Laan, Erik Byers, Frans Blok, Craig Hickman, Oscar Noordman, Rene Carpaij, Troy Gugel, Sander Stegeman, Jouke Krist, Youri van Dommelen, Christian van Os, Jan van Schoot
Publikováno v:
SPIE Proceedings.
Meeting a specific CD uniformity roadmap becomes more and more difficult as different budget components affecting CD uniformity fail to meet their requirements. For example, reticle manufacturing is at the edge of its potential, and hotplates impact
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2731b2d8447075b16c5e3361f4803a1b
https://doi.org/10.1117/12.602129
https://doi.org/10.1117/12.602129
Autor:
Helmut Haidner, Oscar Noordman, Melchior Mulder, Manfred Maul, Marco Hugo Petrus Moers, Jan van Schoot, Robert John Socha, Jan Baselmans, Donis G. Flagello, Xuelong Shi, Jo Finders, Andre Engelen, Wim de Boeij, Martin Schriever, Rene Carpaij, Ulrich Wegmann, Markus Goeppert, Mark van de Kerkhof, Paul Graeupner, Henk van Greevenbroek
Publikováno v:
SPIE Proceedings.
Current roadmaps show that the semiconductor industry continues to drive the usable Rayleigh resolution towards thefundamental limit (for 50% duty cycle lines) at k 1 =0.25. This is being accomplished through use of various resolutionenhancement tech
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::07698b9bd527cac614680a8761581b9b
https://doi.org/10.1117/12.485340
https://doi.org/10.1117/12.485340
Autor:
Frans Blok, Byeong-Ho Cho, Donggyu Yim, Oscar Noordman, Peter Vanoppen, Chanha Park, Jan van Schoot, Thomas Theeuwes, Young-Hong Min
Publikováno v:
SPIE Proceedings.
As resolution shrinks, also the demands for litho CD Uniformity are becoming tighter. In replicating the mask pattern into photoresist, a sequence of modules within the patterning cluster (coat, expose, develop, etch) is responsible for CD non-unifor
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6417199821289d778fed225e8605a713
https://doi.org/10.1117/12.474579
https://doi.org/10.1117/12.474579
Publikováno v:
SPIE Proceedings.
A novel analysis methodology, for the breakdown and ranking of the different sources of line width variation, is presented. The method is applied both on the level of an individual wafer, and on multiple wafers in a batch. It enables evaluation of th
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::aa89cccf2bf25d307ec999712e22e831
https://doi.org/10.1117/12.425226
https://doi.org/10.1117/12.425226
Autor:
Kerstin Woerhoff, Paul V. Lambeck, H. Albers, Oscar Noordman, Niko F. van Hulst, Th. J. A. Popma
Publikováno v:
SPIE Proceedings.
The thickness non-uniformity and refractive index in- homogeneity of silicon oxynitride thin films, grown by low pressure chemical vapor deposition, have been optimized. The present work was especially motivated by the application of these thin films
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::21eb413b04d032d9d3764496a5c5f2fb
https://doi.org/10.1117/12.281235
https://doi.org/10.1117/12.281235
Autor:
Gary Politi, Vladan Blahnik, Michael Patra, Jan Baselmans, Oscar Noordman, Manfred Maul, James G. Tsacoyeanes, A. S. Tychkov
Publikováno v:
Journal of Micro/Nanolithography, MEMS, and MOEMS. 8:043002
In recent years speckle in optical projection microlithography received increasing interest because of its potential contribution to linewidth roughness (LWR). Speckle is a light interference effect that causes the dose delivered to the reticle to be
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c7128f779af79e23a5605e857d13b637
https://doi.org/10.1117/1.3256131
https://doi.org/10.1117/1.3256131