Zobrazeno 1 - 10
of 23
pro vyhledávání: '"Osamu Yokokoji"'
Publikováno v:
Liquid Crystals. 36:799-807
The synthesis and properties of (E)-α,β-difluorostilbene derivatives were studied. In particular, we investigated three suppression methods of (E)–(Z) isomerisation by shortening the molecular conjugation length, which included the introduction o
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e97ea979ebf902cc1d6b3af77b8c48bc
https://doi.org/10.1080/02678290903062986
https://doi.org/10.1080/02678290903062986
Publikováno v:
Liquid Crystals. 36:1-6
We have designed and synthesised the novel liquid crystal core structure, 2-phenyl-5,6-difluoro-1H-indene, based on preliminary calculation of the theoretical values of birefringence (Δn) and dielectric anisotropy (Δϵ). These compounds have been p
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5c2f7fc55af5c5e9f6f6de58db5a1faf
https://doi.org/10.1080/02678290802680813
https://doi.org/10.1080/02678290802680813
Publikováno v:
Liquid Crystals. 35:995-1003
The synthesis and properties of (S)‐(2‐methylbutyl)benzene derivative and (S)‐2‐phenylpropionic acid derivatives were studied with a view to their application on cholesteric liquid crystal devices. Compared with available chiral compounds the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::72d1c904e6e95c972cb04fc25edb4690
https://doi.org/10.1080/02678290802308068
https://doi.org/10.1080/02678290802308068
Autor:
Takeo Ishibashi, Jianhai Jiang, Tetsuro Hanna, Yoko Takebe, Tomoharu Fujiwara, Teruhiko Kumada, Shinya Wakamizu, Takafumi Niwa, Osamu Yokokoji, Takuya Hagiwara, Mamoru Terai, Hideharu Kyouda
Publikováno v:
Journal of Photopolymer Science and Technology. 21:665-672
In this study, we focus on the controllability of a wafer bevel from adhesion and hydrophobicity viewpoints in order to solve the problems of film peeling and microdroplet formation around wafer bevels, which can result in pattern defects and degradi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fe0d70a7d46767583b2b90ab50ed7986
https://doi.org/10.2494/photopolymer.21.665
https://doi.org/10.2494/photopolymer.21.665
Autor:
Naoki Man, Tetsuro Hanawa, Takuya Hagiwara, Yusuke Tanahashi, Kazuhiro Yoshikawa, Teruhiko Kumada, Mamoru Terai, Takeshi Matsunobu, Takeo Ishibashi, Osamu Yokokoji, Naoko Shirota
Publikováno v:
Journal of Photopolymer Science and Technology. 21:647-654
Non-topcoat (non-TC) resists, which blend hydrophobic additives into a resist polymer, have been proposed by vendors. To minimize the surface free energy, a hydrophobic additive segregates to the surface and forms a layer. The improvement of surface
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6a739ed6f4a331ec4a43d3c3a2c8409c
https://doi.org/10.2494/photopolymer.21.647
https://doi.org/10.2494/photopolymer.21.647
Publikováno v:
Journal of Photopolymer Science and Technology. 19:573-578
We earlier developed new monocyclic fluoropolymers (FUGU) for F2 resist materials. But, it is necessary for FUGU to be improved in their characteristics, especially in the dry-etching resistance, in order to apply to ArF lithography at fine design ru
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f740310c39a49a06d1267e0900517e4c
https://doi.org/10.2494/photopolymer.19.573
https://doi.org/10.2494/photopolymer.19.573
Autor:
Sasaki Takashi, Yoko Takebe, Osamu Yokokoji, Kiyoshi Fujii, Akihito Otoguro, Toshio Itani, Masataka Eda, Shigeo Irie
Publikováno v:
Journal of Photopolymer Science and Technology. 17:639-644
We earlier developed a series of fluoropolymers (FPRs) for use as first-generation 157-nm photoresist polymers. These FPRs have a partially fluorinated monocyclic structure and provide excellent transparency. However, their etching resistance is low
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4121e4b31b9d66d2824891b0438fcb84
https://doi.org/10.2494/photopolymer.17.639
https://doi.org/10.2494/photopolymer.17.639
Autor:
Shigeo Irie, Seiichi Ishikawa, Takuya Hagiwara, Tamio Yamazaki, Takamitsu Furukawa, Toshiro Itani, Yasuhide Kawaguchi, Syun-ichi Kodama, Osamu Yokokoji, Isamu Kaneko, Yoko Takebe, Shinji Okada
Publikováno v:
Japanese Journal of Applied Physics. 42:3743-3747
Fluoropolymers are key materials for single layer resists of 157-nm lithography. We have been studying fluoropolymers to identify their potential for base resins of 157-nm photoresist. New monocyclic fluoropolymer resist which we developed have high
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d3453da39f466764b52814856e206dd8
https://doi.org/10.1143/jjap.42.3743
https://doi.org/10.1143/jjap.42.3743
Autor:
Takuya Hagiwara, Toshiro Itani, Yasuhide Kawaguchi, Shunichi Kodama, Shigeo Irie, Osamu Yokokoji
Publikováno v:
Journal of Photopolymer Science and Technology. 16:557-564
Fluoropolymers are key materials for the single-layer resists used in 157-nm lithography. We have been studying fluoropolymers to determine their potential for use as the base resin. We developed a polymer that has high transmittance and high dry-etc
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::15f2dec221784c086431d58062bd0fb4
https://doi.org/10.2494/photopolymer.16.557
https://doi.org/10.2494/photopolymer.16.557
Publikováno v:
Microelectronic Engineering. 83:1091-1093
We earlier developed new monocyclic fluoropolymers (FUGU) for F 2 resist materials. But, it is necessary for FUGU to improve of their characteristics, especially the dry-etching resistance, in order to apply for ArF lithography at fine design rules.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::c8e79e3ae293805f6bb5ca459fa739c6
https://doi.org/10.1016/j.mee.2006.01.024
https://doi.org/10.1016/j.mee.2006.01.024