Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Osamu Deguchi"'
Publikováno v:
Journal of Applied Physics. 78:6534-6538
Ten kinds of Al‐based layered metallizations were fabricated and investigated to find out how a refractory metal underlayer affects the crystallographic characteristics of an Al layer and, in consequence, the electromigration resistance of the meta
Publikováno v:
Japanese Journal of Applied Physics. 36:2077
Electromigration characteristics are analyzed using the resistance increase curves of ten kinds of Al-based layered metallizations. It was found that the shape of the resistance curve is basically determined by the layered structure and its material,
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 14:687
Electromigration study of various layer‐structured aluminum conductors with three widths revealed that lifetime (defined as a 1% resistance increase) depends on two critical parameters: the grain size/conductor width ratio and the grain orientation