Zobrazeno 1 - 10
of 23
pro vyhledávání: '"Osami Okada"'
Publikováno v:
Physica A: Statistical Mechanics and its Applications. 392:4127-4133
An investigation was made regarding to what extent road network patterns are reproduced by a crack model from a viewpoint that they seem to resemble crack patterns in morphology. A desiccation model using double-layered cellular meshes was considered
Autor:
Satoshi Hatori, Ken Ohashi, Keisuke Yasuda, Yoshifumi Ito, Ryoya Ishigami, Shintarou Tanaka, Osami Okada
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 183:323-328
The effects of 200 MeV proton irradiation on the magnetic flux of Nd–Fe–B and Sm–Co magnets have been investigated over the dose range from ∼102 Gray to ∼2×105 Gray. Nd–Fe–B magnets with coercive force Hcj 1.15 MA/m and 2.5 MA/m were u
Autor:
Osami Okada
Publikováno v:
Studies in Regional Science. 32:315-327
Research and development of works sited at Techno-Port Fukui was surveyed. Techno-Port Fukui is one of the most successful industrial parks and 66 blocks out of 77 have been sited. The survey was made on the 40 works among 66 who accepted the intervi
Autor:
Osami Okada
Publikováno v:
Fusion Technology. 33:130-135
A new type of divertor, a dipole divertor is described. The dipole divertor is composed of a line dipole and is characterized by a simple configuration and the realization of a double-null separatrix with a small distortion on the equilibrium magneti
Publikováno v:
Journal of Applied Physics. 62:1459-1468
The Si etch rate in an (F2+O2) microwave plasma has been measured as a function of O2 mixing ratio at a fixed total pressure of 5.3×10−2 Pa. The etch rate significantly decreases with the mixing ratio. This etch rate decrease is due primarily to s
Publikováno v:
Journal of the Physical Society of Japan. 42:1744-1751
A low frequency electrostatic instability in toroidal geometry is analysed with the two fluid equations. This instability is driven by the charge separation of plasma due to the toroidicity. The growth rate is largest when the parallel wave number is
Publikováno v:
Long Range Planning. 22:54-63
Research and development planning at the Central Research Laboratory at Hitachi Ltd. is reviewed and discussed, including its organization, resource allocation, interactions and collaborations, the cultivation of innovative ideas and the evaluation o
Autor:
Osami Okada
Publikováno v:
SHINKU. 28:168-176
Publikováno v:
Journal of Applied Physics. 58:1177-1182
The etch rate of Si with F atoms was measured by the use of F2 microwave plasma over a range of discharge pressures between 2.7×10−2 and 17 Pa. Fluorine atom concentration in the plasma was determined over the same pressure range by means of both
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 4:1791-1794
CF radicals in a C3F8 microwave plasma were detected by laser induced fluorescence (LIF). CF2 radicals in C3F8 and CF4 plasma were also observed by using the same technique. At discharge pressures of 0.13 and 4.0 Pa, the relative densities of both ra