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pro vyhledávání: '"Ordnung, Daniel Alfred"'
Autor:
Dirdal, Christopher A., Jensen, Geir Uri, Angelskår, Hallvard, Thrane, Paul Conrad Vaagen, Gjessing, Jo, Ordnung, Daniel Alfred
We demonstrate the fabrication of diffraction-limited dielectric metasurface lenses for NIR by use of standard industrial high throughput silicon processing techniques: UV Nano Imprint Lithography (UV-NIL) combined with continuous Reactive Ion Etchin
Externí odkaz:
http://arxiv.org/abs/2004.11133
