Zobrazeno 1 - 10
of 23
pro vyhledávání: '"Omor F. Shoron"'
Autor:
Zhanbo Xia, Nidhin Kurian Kalarickal, Caiyu Wang, Hao Yang, Christopher R. Freeze, Siddharth Rajan, Susanne Stemmer, Omor F. Shoron, Nick Combs, Junao Cheng, Wu Lu
Publikováno v:
IEEE Electron Device Letters. 41:621-624
High-current molecular beam epitaxial perovskite oxide semiconductor BaTiO3/BaSnO3 heterostructure field effect transistors on SrTiO3 substrates were developed. Record high current density of $\text{I}_{{\mathrm{max}}} =406.7$ mA/mm, maximum transcon
Autor:
Timo Schumann, Manik Goyal, Omor F. Shoron, Susanne Stemmer, David A. Kealhofer, Anton Burkov
Publikováno v:
Applied Physics Letters. 119:171907
Topological protection against localization causes electrical transport phenomena in disordered topological materials to differ from those in topologically trivial systems. For example, a transition between a regime of weak localization to one of wea
Publikováno v:
DRC
Recent development of topological materials has opened up a new paradigm of material research. Unique electronics properties make these materials interesting to study new physics of materials. Thin film epitaxial growth gives an additional control pa
Publikováno v:
Advanced Electronic Materials. 6:2000676
Autor:
Luca Galletti, Omor F. Shoron, Susanne Stemmer, Timo Schumann, David A. Kealhofer, Honggyu Kim, Manik Goyal
Publikováno v:
Physical Review B. 97
Three-dimensional topological Dirac semimetals are a new state of matter. The authors report on experiments that directly access the electronic structure of two-dimensional states in the prototype topological Dirac semimetal Cd${}_{3}$As${}_{2}$. By
Autor:
Junao Cheng, Chris Freeze, Siddharth Rajan, Susanne Stemmer, Hareesh Chandrasekar, Hao Yang, Nick Combs, Caiyu Wang, Wu Lu, Omor F. Shoron, Nidhin Kurian Kalarickal, Wangzhou Wu
Publikováno v:
Journal of Vacuum Science & Technology B. 38:012201
The etching of epitaxially grown perovskite oxide BaSnO3 (BSO) and BaTiO3 (BTO) thin films is studied using Cl-based (BCl3/Ar) and F-based (CF4/Ar) plasma chemistries in an inductively coupled plasma reactive ion etching (ICP-RIE) system for the deve
Publikováno v:
Applied Physics Letters, vol 115, iss 6
Cadmium arsenide (Cd3As2) is a three-dimensional Dirac semimetal with many unique electronic properties that are of interest for future device applications. Here, we demonstrate field effect transistors using Cd3As2 as the channel material. We show t
Publikováno v:
Microscopy and Microanalysis. 23:1578-1579
Publikováno v:
ECS Transactions. 35:363-373
Band to band tunneling current of strained InxGa1-xAs (x=0.47,0.65, 0.75) surface channel double gate TFET has been calculated using a simple numerical model. This proposed model provides reasonably accurate result for planner TFETs in low voltage (b
Publikováno v:
Applied Physics Letters. 110:232902
Integration of ultrathin ferroelectric thin films with semiconductors is of interest for negative capacitance transistors that exhibit internal voltage gain, which may allow for scaling the supply voltage of low power circuits. In this study, BaTiO3