Fundamental understanding of chemical processes in extreme ultraviolet resist materials.

Autor: Kostko, Oleg, Xu, Bo, Ahmed, Musahid, Slaughter, Daniel S., Ogletree, D. Frank, Closser, Kristina D., Prendergast, David G., Naulleau, Patrick, Olynick, Deirdre L., Ashby, Paul D., Liu, Yi, Hinsberg, William D., Wallraff, Gregory M.

Publikováno v: Journal of Chemical Physics; 2018, Vol. 149 Issue 15, pN.PAG-N.PAG, 9p, 6 Graphs

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Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features

Autor: Dallorto, Stefano, Staaks, Daniel, Schwartzberg, Adam, Yang, XiaoMin, Lee, Kim Y, Rangelow, Ivo W, Cabrini, Stefano, Olynick, Deirdre L

Publikováno v: Dallorto, S; Staaks, D; Schwartzberg, A; Yang, X; Lee, KY; Rangelow, IW; et al.(2018). Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features. Nanotechnology, 29(40). doi: 10.1088/1361-6528/aad393. Lawrence Berkeley National Laboratory: Retrieved from: http://www.escholarship.org/uc/item/2mq5j0t3
Nanotechnology, vol 29, iss 40

© 2018 IOP Publishing Ltd. The next generation of hard disk drive technology for data storage densities beyond 5 Tb/in2will require single-bit patterning of features with sub-10 nm dimensions by nanoimprint lithography. To address this challenge mas

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::97fc841ae7157d0ecebad5e44ec5be83
http://www.escholarship.org/uc/item/2mq5j0t3

Selectively accessing the hotspots of optical nanoantennas by self-aligned dry laser ablation.

Autor: Schäfer, Christian, Perera, Pradeep N., Laible, Florian, Olynick, Deirdre L., Schwartzberg, Adam M., Weber-Bargioni, Alexander, Cabrini, Stefano, Schuck, P. James, Kern, Dieter P., Fleischer, Monika

Publikováno v: Nanoscale; 10/7/2020, Vol. 12 Issue 37, p19170-19177, 8p

Selective Laser Ablation in Resists and Block Copolymers for High Resolution Lithographic Patterning

Autor: Olynick, Deirdre L., Perera, Pradeep, Schwartzberg, Adam, Kulshreshta, Prashant, Dimas G. de Oteyza, Jarnagin, Nathan, Henderson, Cliff, Sun, Zhiwei, Gunkel, Ilja, Russell, Thomas, Budden, Matthias, Rangelow, Ivo W.

Publikováno v: Journal of Photopolymer Science and Technology, vol 28, iss 5
ResearcherID
Olynick, DL; Perera, P; Schwartzberg, A; Kulshreshta, P; De Oteyza, DG; Jarnagin, N; et al.(2015). Selective laser ablation in resists and block copolymers for high resolution lithographic patterning. Journal of Photopolymer Science and Technology, 28(5), 663-668. doi: 10.2494/photopolymer.28.663. Lawrence Berkeley National Laboratory: Retrieved from: http://www.escholarship.org/uc/item/3tb0b4w8

� 2015 SPST. Previously, we demonstrated an all dry, selective laser ablation development in methyl acetoxy calixarene (MAC6) which produced high resolution (15-25 nm half-pitch), high aspect ratio features not achievable with wet development. I

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::2d5023a323fa5cd938db696ff3db04b2
https://escholarship.org/uc/item/3tb0b4w8