Výsledky vyhledávání - "Olivia B. Bromley"

Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition

Autor: Olivia B. Bromley, Pieter C. Rowlette, Colin A. Wolden, C. G. Allen

Publikováno v: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 27:761-766

Self-limiting growth of zinc oxide was accomplished over a temperature range from 25to155°C by pulsed plasma-enhanced chemical vapor deposition using dimethyl zinc [Zn(CH3)2] as the metal precursor. The deposition rate was independent of plasma expo

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::0d17dbd2881071154aaba27fa3fc7b3a
https://doi.org/10.1116/1.3119673

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Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc

Autor: Pieter C. Rowlette, Olivia B. Bromley, Colin A. Wolden, C. G. Allen, Amy E. Dubetz

Publikováno v: Chemical Vapor Deposition. 15:15-20

Zinc oxide films are deposited over the temperature range 25–120 °C by plasma-enhanced atomic layer deposition (PEALD) using dimethyl zinc (DMZ, Zn(CH3)2) as the metal precursor. DMZ is unreactive with molecular oxygen under process conditions, fa

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::1996ec523b3b8d72514ce1eefb8d0799
https://doi.org/10.1002/cvde.200806725

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