Zobrazeno 1 - 6
of 6
pro vyhledávání: '"Oliver Franken"'
Autor:
Gerhard Wiegleb, Oliver Franken, Jürgen Reinmann, Thomas Beyer, Julian Edler, Rolf Schiffler, Stefan Römisch, Roland Bianchin, David Triebel, Thomas Eisenmann
Publikováno v:
Gasmesstechnik in Theorie und Praxis ISBN: 9783658106867
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8c612448928b43bf54202f5b795b7024
https://doi.org/10.1007/978-3-658-10687-4_14
https://doi.org/10.1007/978-3-658-10687-4_14
Autor:
Pierre Bonnel, Oliver Franken, A. Krasenbrink, Urbano Manfredi, L. Rubino, Giorgio Martini, Mario Bonifacio, Giorgio Beghella Bartoli, Massimo Carriero
Publikováno v:
SAE Technical Paper Series.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7ffdc30fe71c0f0a09e303ac0e8a3d17
https://doi.org/10.4271/2010-01-1068
https://doi.org/10.4271/2010-01-1068
Publikováno v:
Innovation in Food Engineering ISBN: 9781420086065
Innovation in Food Engineering: New Techniques and Products
Innovation in Food Engineering: New Techniques and Products
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f61bde16f44efb1b65a9476d62ac97e3
https://doi.org/10.1201/9781420086072-c14
https://doi.org/10.1201/9781420086072-c14
Autor:
Max C. Schürmann, Peter Zink, Günther Derra, Erik Wagenaars, Marc Corthout, Hans Scheuermann, Guido Schriever, Jeroen Jonkers, Rolf Apetz, Guido Seimons, Marcel Damen, Peiter van de Wel, Rob Snijkers, Jesko Dr. Brudermann, Jürgen Klein, Masaki Yoshioka, Willi Neff, Oliver Franken, Oliver Zitzen, Dominik Marcel Vaudrevange, Felix Küpper, Arnaud Mader
Publikováno v:
SPIE Proceedings.
For industrial EUV (extreme ultra-violet) lithography applications high power extreme ultraviolet (EUV) light sources are needed at a central wavelength of 13.5 nm, targeting 32 nm node and below. Philips Extreme UV GmbH and XTREME technologies GmbH
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2d8e8a04b4a2de39e064683cab332b4a
https://doi.org/10.1117/12.772633
https://doi.org/10.1117/12.772633
Autor:
Arnaud Mader, Adam Brunton, Klaus Bergmann, Giorgio Pirovano, Giovanni Bianucci, Hans Scheuermann, Peter Zink, Gian Luca Cassol, Fabio Zocchi, Oliver Franken
Publikováno v:
SPIE Proceedings.
The paper presents the results of an investigation into the thermal and optical characteristics of alpha-type dual-mirror grazing incidence collectors for Extreme Ultra-violet Lithography integrated into a tin-fueled discharge produced plasma source.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::da88e809a3ee66a75d6db7ec894ee910
https://doi.org/10.1117/12.772977
https://doi.org/10.1117/12.772977
Autor:
Willi Neff, Oliver Franken, Andreas List, Marcel Damen, Oliver Zitzen, Maurice Janssen, Klaus Bergmann, Joseph Pankert, Helmar Kraus, Peter Zink, Dominik Marcel Vaudrevange, Dirk Wagemann, Thomas Krücken, Stefan Schwabe, Micheal Loeken, Stefan Seiwert, Rolf Apetz, Oliver Rosier, Günther Derra, Christof Metzmacher, Ralph Prummer, Achim Weber, Jeroen Jonkers, Arnaud Mader, Sven Probst, Guido Siemons, Jürgen Klein
Publikováno v:
SPIE Proceedings.
In this paper, we report on the recent progress of the Philips Extreme UV source. The Philips source concept is based on a discharge plasma ignited in a Sn vapor plume that is ablated by a laser pulse. Using rotating electrodes covered with a regener
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::02052cc3f501f7ec7b98a546edfd7b4f
https://doi.org/10.1117/12.657066
https://doi.org/10.1117/12.657066