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Autor:
Michael S. Afanasiev, Alexey V. Bespalov, Andrey A. Geraskin, Olga L. Golykova, Dmitry V. Kulikov, Alexandra A. Muravyeva, Dmitry O. Smirnov, Igor A. Kharitonov, Ruslan S. Shabardin
Publikováno v:
Безопасность информационных технологий, Vol 30, Iss 3, Pp 116-125 (2023)
The process of recrystallization occurring at temperature of +80°C in aluminum (Al) conductors of integrated circuits (IC) designed to operate in the range -40°C -+60°C has been studied experimentally by the method of cross sections obtained with
Externí odkaz:
https://doaj.org/article/ce988462bf164b86aa6d445305614a4b