Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Oleksiy Dyachenko"'
Autor:
Oleksiy Dyachenko, Michiel van Setten, Stefan Böttcher, C. Bargsten, Dhirendra P. Singh, Fabian Holzmeier, Paul van der Heide, Henry C. Kapteyn, Geoffrey Pourtois, John S. Petersen, Daisy Raymondson, Raimund Kremzow, Kevin Dorney, Seth L. Cousin, Esben W. Larsen, Eric Rinard, Marko Wietstruk, Rod Ward, Pieter Vanelderen, Thomas Nuytten
Publikováno v:
Novel Patterning Technologies 2021.
Imec’s AttoLab is the first industrial laboratory capable of watching the ultrafast dynamics of photoresists following 13.5 nm, EUV exposure, and for emulating high-numerical-aperture (high-NA) exposure on 300-mm wafers using two-beam EUV interfere
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::79c75220040bd26112ca48ac884c0018
https://doi.org/10.1117/12.2595038
https://doi.org/10.1117/12.2595038
Autor:
Yevgeniy Shapiro, Wolfgang Harneit, Nadine Diek, Michael Reichling, Rajesh Tamang, Andriy Borodin, Oleksiy Dyachenko
Publikováno v:
Chemical Physics Letters. 640:72-76
Diamond surfaces with (1 0 0) orientation and perfect phase purity regarding the coexistence of sp3 and sp2 bonding as well as near surface nitrogen implanted layers are repeatedly produced from one sample by a cycle of nitrogen implantation, etching
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b99ad6a27c53332b756b9acf614a727e
https://doi.org/10.1016/j.cplett.2015.10.015
https://doi.org/10.1016/j.cplett.2015.10.015