Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Ogiewa, Marcel"'
Autor:
Mueller, Steve, Waechtler, Thomas, Hofmann, Lutz, Tuchscherer, Andre, Mothes, Robert, Gordan, Ovidiu, Lehmann, Daniel, Haidu, Francisc, Ogiewa, Marcel, Gerlich, Lukas, Ding, Shao-Feng, Schulz, Stefan E., Gessner, Thomas, Lang, Heinrich, Zahn, Dietrich R.T., Qu, Xin-Ping
Publikováno v:
Semiconductor Conference Dresden (SCD), 27-28 Sept. 2011, Dresden, Germany; DOI: 10.1109/SCD.2011.6068736
In this work, an approach for copper atomic layer deposition (ALD) via reduction of CuxO films was investigated regarding applications in ULSI interconnects, like Cu seed layers directly grown on diffusion barriers (e. g. TaN) or possible liner mater
Publikováno v:
Europhys. Lett. 87, 10002 (2009)
We investigate the transport of a single excitation through a chain of weakly coupled subunits. At both ends the chain is exposed to baths which are incorporated by means of a master equation in Lindblad form. This master equation is solved by the us
Externí odkaz:
http://arxiv.org/abs/0906.2869
Autor:
Mueller, Steve, Waechtler, Thomas, Hofmann, Lutz, Tuchscherer, Andre, Mothes, Robert, Gordan, Ovidiu, Lehmann, Daniel, Haidu, Francisc, Ogiewa, Marcel, Gerlich, Lukas, Ding, Shao-Feng, Schulz, Stefan E., Gessner, Thomas, Lang, Heinrich, Zahn, Dietrich R.T., Qu, Xin-Ping
Publikováno v:
Semiconductor Conference Dresden (SCD), 27-28 Sept. 2011, Dresden, Germany; DOI: 10.1109/SCD.2011.6068736
In this work, an approach for copper atomic layer deposition (ALD) via reduction of CuxO films was investigated regarding applications in ULSI interconnects, like Cu seed layers directly grown on diffusion barriers (e. g. TaN) or possible liner mater
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=od_______218::e7d72e266f138c0dfe16af5e8a18b368
https://monarch.qucosa.de/id/qucosa:19675
https://monarch.qucosa.de/id/qucosa:19675
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