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Autor:
Ofir Gan, Brid Connolly, Massimiliano Pindo, Assia Barkai, Paul C. Allen, Harel Frish, Peter Buck
Publikováno v:
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics V.
In this paper we present a 45-degree mirror created for optical applications utilizing CMOS high-volume manufacturing processes with a gray-scale lithography technique. The process that is presented here was done by creating a 3D pattern in the photo
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f9f352f5b36741cc7407a1ace92bcae4
https://doi.org/10.1117/12.907275
https://doi.org/10.1117/12.907275
