Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Oded Dassa"'
Autor:
Ariel Shkalim, Alexander Chereshnya, Paul Crider, Oren Cohen, Oded Dassa, Ronen Madmon, Evgeny Bal, Ori Petel, Boaz Cohen
Publikováno v:
Photomask Technology 2019.
193nm mask inspection will remain a viable solution for inspection of ArF technology masks for the 7nm/5nm technology node and beyond, even in the era of EUV lithography. In the ArF technology, pitch multiplication (SADP, SAQP, etc.) will continue to
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::608d58615ae847a99020564748409baf
https://doi.org/10.1117/12.2537511
https://doi.org/10.1117/12.2537511
Publikováno v:
Aquaculture. 218:379-386
A large amount of feed and other organic material is found as suspended matter in super intensive fish production tanks. Both treatment and recycling of these organic materials depend on the size and stability of the particles in suspension. The stab
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::00e2b4406867ca5491e76c4b14b17d84
https://doi.org/10.1016/s0044-8486(02)00652-x
https://doi.org/10.1016/s0044-8486(02)00652-x
Autor:
Wei-Guo Lei, Joan McCall, Rajesh Nagpal, Jun Kim, Vivek Balasubramanian, Mark Wagner, Udy Danino, Suheil J. Zaatri, Michael Ben-Yishai, Lev Faivishevsky, Tejas H. Shah, Shmoolik Mangan, Michael Penn, Oded Dassa, Aviram Tam
Publikováno v:
SPIE Proceedings.
Die-to-Model (D2M) inspection is an innovative approach to running inspection based on a mask design layout data. The D2M concept takes inspection from the traditional domain of mask pattern to the preferred domain of the wafer aerial image. To achie
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::43a2d0664643cf72e3b4d1e250d79f4a
https://doi.org/10.1117/12.829637
https://doi.org/10.1117/12.829637
Publikováno v:
Journal of The Electrochemical Society. 153:G91
Self-assembled monolayers (SAMs) of long-chain thiols were deposited on lattice-matched InGaAs layers grown on InP(100). A significant reduction of oxygen concentration on the surface and enhancement of the steady-state photoluminescence intensity wa
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d384a42d8f5080070c0db99f7ff0cf9b
https://doi.org/10.1149/1.2136072
https://doi.org/10.1149/1.2136072