Characteristics for negative and positive tone resists with direct write electron beam and SCALPEL exposure systems.

Autor: Sato, Mitsuru, Ocala, L. E., Novembre, A. E., Ohmori, Katsumi, Ishikawa, Kiyoshi, Katsumata, Katsuhiko, Nakayama, Toshimasa

Publikováno v: Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1999, Vol. 17 Issue 6, p2873-2877, 5p