Characterization and modeling of antireflective coatings of SiO2, Si3N4, and SiOxNy deposited by electron cyclotron resonance enhanced plasma chemical vapor deposition.

Autor: Mestanza, S. N. M., Obrador, M. P., Rodriguez, E., Biasotto, C., Doi, I., Diniz, J. A., Swart, J. W.

Publikováno v: Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; Mar/Apr2006, Vol. 24 Issue 2, p823-827, 5p, 8 Graphs