Zobrazeno 1 - 10
of 85
pro vyhledávání: '"Obert Wood"'
Autor:
Obert Wood
Publikováno v:
Journal of Photopolymer Science and Technology. 30:599-604
Publikováno v:
International Conference on Extreme Ultraviolet Lithography 2018.
As the power of laser produced plasma sources has increased, EUV lens heating has become a major component of process variation. Differential lens heating can cause thermal aberrations which affect system drift during operation, therefore pupil plane
Autor:
Erik Verduijn, Dirk Hellweg, Timothy A. Brunner, Grizelda Kersteen, Renzo Capelli, Obert Wood, Martin Dietzel, Xuemei Chen
Publikováno v:
Extreme Ultraviolet (EUV) Lithography IX.
As more aggressive EUV imaging techniques and resists with lower intrinsic roughness are developed for patterning at 7nm and 5nm technology nodes, EUV mask roughness will contribute an increasing portion of the total printed linewidth roughness (LWR)
Autor:
Allen H. Gabor, Lars W. Liebmann, Xuemei Chen, Michael E. Kling, Daniel Schmidt, Obert Wood, Yulu Chen, Lei Sun, Francis Goodwin, Shuo Zhao, Feixiang Luo
Publikováno v:
Extreme Ultraviolet (EUV) Lithography IX.
Although lens aberrations in EUV imaging systems are very small, aberration impacts on pattern placement error and overlay error need to be carefully investigated to obtain the most robust lithography process for high volume manufacturing. Instead of
Autor:
Erik R. Hosler, Obert Wood
Publikováno v:
Springer Proceedings in Physics ISBN: 9783319730240
Laser-produced plasma extreme-ultraviolet (EUV) sources currently power EUV lithography tools, supporting advanced semiconductor manufacturing research and development. However, a source with sufficient power to support high-volume manufacturing has
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::460631fa93db8d385037e93742874c44
https://doi.org/10.1007/978-3-319-73025-7_52
https://doi.org/10.1007/978-3-319-73025-7_52
Autor:
Ulrich Klostermann, Obert Wood, Francis Goodwin, Yulu Chen, Sajan Marokkey, Xiangyu Zhou, Lei Sun, Mariya Braylovska
Publikováno v:
Photomask Technology.
Pellicles that satisfy transmission, emission, thermal, and mechanical requirements are highly desired for EUV high volume manufacturing. We present here the capability of integrating pellicles in the full flow of rigorous EUV lithography simulations
Autor:
Markus P. Benk, Ken Goldberg, Obert Wood, Jeremy McCord, Bryan S. Kasprowicz, Henry Kamberian, Pawitter Mangat, Wallow Thomas I, Yulu Chen
Publikováno v:
International Conference on Extreme Ultraviolet Lithography 2017.
This paper provides experimental measurements of through-focus pattern shifts between contact holes in a dense array and a surrounding pattern of lines and spaces using the SHARP actinic microscope in Berkeley. Experimental values for pattern shift i
Publikováno v:
SPIE Proceedings.
Laser-produced plasma (LPP) EUV sources have demonstrated approximately 125 W at customer sites, establishing confidence in EUV lithography as a viable manufacturing technology. However, beyond the 7 nm technology node existing scanner/source technol
Autor:
Obert Wood, Jongwook Kye, Francis Goodwin, Eric M. Gullikson, Lei Sun, Jed H. Rankin, Julia Meyer-Ilse, Zhengqing John Qi, Yulu Chen
Publikováno v:
SPIE Proceedings.
Unlike optical masks which are transmissive optical elements, use of extreme ultraviolet (EUV) radiation requires a reflective mask structure - a multi-layer coating consisting of alternating layers of high-Z (wave impedance) and low-Z materials that
Publikováno v:
SPIE Proceedings.
The prospect of EUVL (Extreme Ultraviolet Lithography) insertion into HVM (High Volume Manufacturing) has never been this promising. As technology is prepared for "lab to fab" transition, it becomes important to comprehend challenges associated with