Zobrazeno 1 - 10
of 19
pro vyhledávání: '"Oberdan W. Otto"'
Publikováno v:
SPIE Proceedings.
A compact, low-cost wavefront sensor has been demonstrated to measure dynamic disturbances in 1-3 m diameter optical systems. With 448 subapertures and 4 KHz frame rate, it can measure disturbances up to 2 KHz at a level of 1/3800 waves rms at 0.65
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ac7bdc61a12e2381e7d64697e9f0b7c1
https://doi.org/10.1117/12.558375
https://doi.org/10.1117/12.558375
Autor:
Richard C. Henderson, Oberdan W. Otto
Publikováno v:
SPIE Proceedings.
This paper reports advances to the Parametric Anchoring methodology in which a small number of representative line- space process measurements can be used to fit a process model to be used for Optical Proximity Correction (OPC). A correction rule tab
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8ff290bd6d01d62a977c2d5a57e62826
https://doi.org/10.1117/12.262828
https://doi.org/10.1117/12.262828
Publikováno v:
SPIE Proceedings.
This paper demonstrates a new methodology called parametric anchoring in which a small number of representative line-space measurements are used to match a given lithographic process to computational models for a rule-based optical enhancement scheme
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ee230b84959dfdba7239a2a367d4f8b7
https://doi.org/10.1117/12.228212
https://doi.org/10.1117/12.228212
Publikováno v:
SPIE Proceedings.
The virtues of mask-plane assist features for improving imaging performance of generic ASIC layouts in the 0.5k1 realm has been previously proclaimed. In this report we provide experimental verification and introduce a methodology to automatically de
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::503d723ea31c5d098759a353448bb623
https://doi.org/10.1117/12.209262
https://doi.org/10.1117/12.209262
Autor:
Rainer Pforr, Anthony Yen, Kurt G. Ronse, Gene E. Fuller, Shane R. Palmer, Oberdan W. Otto, Luc Van den Hove
Publikováno v:
SPIE Proceedings.
The effectiveness of two methods of optical proximity correction based on feature biasing and subresolution assisting features is compared by simulation and experiments. Parameters examined are overlapping focus- exposure windows for dense lines, sem
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::354f34f86308950cad7ed0f09d8c33d2
https://doi.org/10.1117/12.209249
https://doi.org/10.1117/12.209249
Autor:
Oberdan W. Otto, Richard C. Henderson
Publikováno v:
SPIE Proceedings.
In an earlier work we demonstrated the feasibility of automated software correction for imaging and process proximity effects by precompensating mask layout data. As correction techniques and algorithms continue to be refined, it is important to deal
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ec283a7338c0e49934583c96a61b6313
https://doi.org/10.1117/12.209251
https://doi.org/10.1117/12.209251
Autor:
Richard C. Henderson, Oberdan W. Otto
Publikováno v:
SPIE Proceedings.
With i-line steppers and 0.5 micrometers lines the line size error due to the optical proximity effect is shown by simulation to be 35% - 60% of the CD error budget. Correcting for the error with individual feature biasing requires potentially thousa
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1024a1777576c02c41e8f50a0f52c787
https://doi.org/10.1117/12.195817
https://doi.org/10.1117/12.195817
Autor:
Christophe Pierrat, Sheila Vaidya, Chi-Min Yuan, K. K. Low, Robert L. Kostelak, Joseph G. Garofalo, Richard C. Henderson, Oberdan W. Otto, P.K. Vasudev
Publikováno v:
SPIE Proceedings.
In this work we demonstrate the power, speed, and effectiveness of an automated rules-based approach for performing optical proximity correction. The approach applies to both conventional and phase-shifting mask layouts for optical lithography. Compl
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::95435b51db240752267051da77a479fa
https://doi.org/10.1117/12.175422
https://doi.org/10.1117/12.175422
Autor:
Oberdan W. Otto, Richard C. Henderson
Publikováno v:
SPIE Proceedings.
The optical proximity effect can be a substantial fraction of the CD error budget. It is insufficient to determine the proximity effect as the difference between line-width in an equal line/gap pattern with that of an isolated line. Other geometries
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::953dff49bf11b908a31552dfa4788bc3
https://doi.org/10.1117/12.175430
https://doi.org/10.1117/12.175430
Publikováno v:
SPIE Proceedings.
A rule-based compensation for mask feature dimensions is proposed. This technique is based on the post-process measurement of select pattern configurations. These include isolated lines, isolated spaces, and lines and spaces ranging from 5 micrometer
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bbe7196a4ea4c862add5c49c5b9518f8
https://doi.org/10.1117/12.175817
https://doi.org/10.1117/12.175817