Zobrazeno 1 - 10
of 43
pro vyhledávání: '"O.V. Braginsky"'
Autor:
A. T. Rakhimov, S M Zyryanov, Yu. A. Mankelevich, O.V. Braginsky, A.S. Kovalev, Mikhail R. Baklanov, Tatyana Rakhimova, E. M. Malykhin, Dmitry Lopaev, Anna Vasilieva
Publikováno v:
IEEE Transactions on Plasma Science. 37:1697-1704
The interaction of O and H atoms with SiOCH nanoporous low-dielectric-constant (low-k) films is studied in the far plasma afterglow in the absence of ion and photon fluxes on the surface. The loss probabilities of O and H atoms are directly measured
Autor:
Olga Proshina, A.S. Kovalev, A. T. Rakhimov, D. V. Lopaev, Tatyana Rakhimova, O.V. Braginsky, Anna Vasilieva, D. Shamiryan, D. G. Voloshin, K.S. Klopovskiy
Publikováno v:
IEEE Transactions on Plasma Science. 37:1683-1696
In this paper, the experimental and theoretical studies of RF capacitive-coupled-plasma (CCP) discharge at frequency of 81 MHz in Ar/CF4 and Ar/CHF3 mixtures were carried out. The density distributions of CF2, F, and H radicals in the interelectrode
Autor:
Olga Proshina, A. T. Rakhimov, A.S. Kovalev, Dmitry Lopaev, O.V. Braginsky, Anna Vasilieva, Tatyana Rakhimova
Publikováno v:
Journal of Physics D: Applied Physics. 40:6571-6582
This work is devoted to the study of the possibility of obtaining the highest O2(a 1 � g) yield in ED SOG at the high absolute O2(a 1 � g) concentration needed for developing a powerful oxygen–iodine laser pumped by electric discharge. A single
Autor:
D. G. Voloshin, M. A. Olevanov, Olga Proshina, Tatyana Rakhimova, Dmitry Lopaev, Anna Vasilieva, O.V. Braginsky, A. T. Rakhimov, A.S. Kovalev, V. V. Ivanov, Yu. A. Mankelevich
Publikováno v:
IEEE Transactions on Plasma Science. 35:1229-1240
Ion energy distribution functions (IEDFs) at the electrodes in single frequency (SF) and dual frequency (DF) radio-frequency discharges in Ar at pressures of 20 and 45 mtorr are measured and calculated. A numerical simulation of the IEDF on the base
Autor:
Yu. A. Mankelevich, A.S. Kovalev, Olga Proshina, Dmitry Lopaev, Tatyana Rakhimova, O.V. Braginsky, Anna Vasilieva, A. T. Rakhimov
Publikováno v:
Journal of Physics D: Applied Physics. 39:5191-5200
A 2D self-consistent simulation of an rf discharge in a gas flow in pure oxygen over a wide range of discharge parameters was carried out. The simulation was made at the experimental conditions of Part I of this paper for the discharge tube with an H
Autor:
O.V. Braginsky, Anna Vasilieva, A.S. Kovalev, Dmitry Lopaev, Olga Proshina, Yu. A. Mankelevich, A. T. Rakhimov, Tatyana Rakhimova
Publikováno v:
Journal of Physics D: Applied Physics. 39:5183-5190
The scaling on pressure for a discharge singlet oxygen generator based on the rf discharge excitation of O2 flow is studied in the context of the problem of oxygen?iodine laser pumping. With this aim, the evolution of O2(a?1??g) and molecules as well
Autor:
K. S. Klopovsky, O.V. Braginsky, A. T. Rakhimov, A. N. Vasil’eva, Tatyana Rakhimova, D. V. Lopaev, A.S. Kovalev
Publikováno v:
Laser Physics. 16:1161-1174
To understand and reveal the basic physical factors providing the possibility of scaling of a discharged singlet oxygen generator (DSOG) in an oxygen-iodine laser, the production, and transport kinetics of metastable O2(a 1δg) and O2(b 1σ g + ) mol
Autor:
Tatyana Rakhimova, A.S. Kovalev, T.K. Kim, Anna Vasilieva, J.T. Kong, Yu. A. Mankelevich, Dmitry Lopaev, O.V. Braginsky, Olga Proshina, V. V. Ivanov
Publikováno v:
IEEE Transactions on Plasma Science. 34:867-877
A capacitive coupled radio-frequency plasma at argon pressure of 100 mtorr, 13.56 and 81 MHz frequency and high specific input powers has been studied both experimentally and theoretically. The different numerical models were developed and used for s
Autor:
Olga Proshina, Tatyana Rakhimova, A.S. Kovalev, A. T. Rakhimov, S M Zyryanov, Yury Mankelevich, O.V. Braginsky, Mikhail R. Baklanov, Anna Vasilieva, Dmitry Lopaev
Publikováno v:
MRS Proceedings. 1559
Low-k dielectric films can be substantially damaged during plasma processing. High energy UV and VUV photons emitted by plasma play the key role in damaging the porous low-k films directly or indirectly by stimulating chemical reactions with radicals
Autor:
Yu V Kolobyanin, O.V. Braginsky, K. S. Klopovsky, Yu. A. Mankelevich, A. T. Rakhimov, Olga Proshina, Dmitry Lopaev, Tatyana Rakhimova, Anna Vasilieva, Nikolay Popov, A.S. Kovalev
Publikováno v:
XVI International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers.
This work is devoted to the experimental and theoretical study of rf frequency influence on the discharge structure and the O 2 (a 1 D g ) yield in a rf discharge in the tubes with HgO coating for removing atomic oxygen to avoid fast O 2 (a 1 D g ) q