Zobrazeno 1 - 10
of 103
pro vyhledávání: '"O.R. Monteiro"'
Autor:
A. Varela, M.A. Castelo-Branco, A.B. Ribeiro, A.T. Lima, O.R. Monteiro, H. Domingues, M.C. Gonçalves
Publikováno v:
Revista de Ciências Agrárias, Vol 32, Iss 1, Pp 216-222 (2009)
A caracterização de materiais sólidos recorrendo à espectrofotometria de absorção atómica com chama requer a dissolução total das amostras. Este pré-tratamento, para além de consumir tempo analítico, aumenta o risco de contaminações da
Externí odkaz:
https://doaj.org/article/bf9c5af5efbb49048f3358e6126bbe57
Autor:
H. Domingues, M.G. Serrão, J.C. Martins, M.A. Castelo-Branco, O.R. Monteiro, M.L. Fernandes, F. Pires, A.M. Campos, C. Horta, A. Salgueiro, A. Dordio
Publikováno v:
Revista de Ciências Agrárias, Vol 30, Iss 2, Pp 326-334 (2007)
A utilização de lamas residuais urbanas (LRU) em solos agrícolas contribui para o incremento da sua fertilidade e reciclagem destes resíduos, mas as concentrações de alguns metais podem limitar os níveis de aplicação. Neste trabalho, avaliam
Externí odkaz:
https://doaj.org/article/caf0294223f2483da0cd05a0b59c1eea
Publikováno v:
Tribology International. 40:794-799
The wear and friction characteristics of zirconium-ion-implanted AISI D3 tool steel have been investigated using pin-on-disc methods. Ion implantation was carried out using a vacuum-arc-based ion implanter to form multicharged zirconium ion beams at
Publikováno v:
Catalysis Letters. 43:161-166
A new type of ion implantation technique is used to create a non-equilibrium Pt-Sn(IMP) near-surface alloy with ca. 8.6 at% Sn. The surface composition was determined by low-energy ion-scattering (LEIS). The kinetics of the electrooxidation of CO and
Publikováno v:
IEEE Conference Record - Abstracts. 2002 IEEE International Conference on Plasma Science (Cat. No.02CH37340).
Summary form only given. To learn about how large systems of neurons communicate, we need to develop, among other things, methods for growing patterned networks of large numbers of neurons. Success with this challenge will be important to our underst
Publikováno v:
IEEE Conference Record - Abstracts. 2002 IEEE International Conference on Plasma Science (Cat. No.02CH37340).
Summary form only given. Plasma immersion ion implantation (PIII) is a relatively new technology that is used to modify material surface properties. In a PIII process, a negatively biased target is placed in the plasma. The resulting electric field i
Autor:
O.R. Monteiro, A. Anders
Publikováno v:
Proceedings ISDEIV. 18th International Symposium on Discharges and Electrical Insulation in Vacuum (Cat. No.98CH36073).
Micron and sub-micron "macroparticles" are produced along with the plasma at vacuum arc cathode spots. Published data refer to the size range 0.2-100 /spl mu/m. The lower limit is determined by the resolution of the equipment used (usually scanning e
Autor:
O.R. Monteiro, I.G. Brown
Thin films of alumina, chromia, mullite, yttria and zirconia have been synthesized using a plasma-based method called metal plasma immersion ion implantation and deposition (Mepiiid)--a highly versatile plasma deposition technique with ion energy con
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0afef779fec633435cd29cdcd943c6d5
https://doi.org/10.2172/6531
https://doi.org/10.2172/6531
Autor:
I.G. Brown, O.R. Monteiro
Mullite and mullite-like coatings on silicon carbide have been produced by a Metal Plasma Immersion Ion Implantation and Deposition (Mepiiid) technique based on two cathodic vacuum arc sources and concurrent pulse biasing of the substrate in an oxyge
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9be3042dec25072047f640b322d4cdf1
https://doi.org/10.2172/481569
https://doi.org/10.2172/481569
Akademický článek
Tento výsledek nelze pro nepřihlášené uživatele zobrazit.
K zobrazení výsledku je třeba se přihlásit.
K zobrazení výsledku je třeba se přihlásit.