Zobrazeno 1 - 10
of 32
pro vyhledávání: '"O. de Abril"'
Publikováno v:
Thin Solid Films. 520:4144-4149
0.5 μm-thick aluminum-doped zinc oxide (ZnO:Al) films were deposited at 100 °C on polyethylene terephthalate substrates by Radio Frequency magnetron sputtering. The as-deposited films were compact and dense, showing grain sizes of 32.0 ± 6.4 nm an
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5999ff6329c9a009b9ea39ca1eaf54b3
https://doi.org/10.1016/j.tsf.2011.04.207
https://doi.org/10.1016/j.tsf.2011.04.207
Publikováno v:
physica status solidi c. 9:1065-1069
Nitride semiconductors (Al,Ga,In)N attain material properties that make them suitable for photovoltaic and optoelectronics devices to be used in hard environments. These properties include an energy gap continuously tuneable within the energy range o
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4dc2e6b34a45df0a235130845f659afe
https://doi.org/10.1002/pssc.201100146
https://doi.org/10.1002/pssc.201100146
Publikováno v:
Solar Energy Materials and Solar Cells. 95:2281-2286
ZnO:Al films deposited at 250 °C on Corning glass by radio frequency magnetron sputtering were studied for their use as front contact for thin film silicon solar cells. For this purpose, a two-step etching method combining different concentrations o
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::74c1f389c6ae5a2b785d773e31530087
https://doi.org/10.1016/j.solmat.2011.03.042
https://doi.org/10.1016/j.solmat.2011.03.042
Publikováno v:
physica status solidi (a). 207:1717-1721
InN/ZnO:Al heterostructures deposited at low temperature on Different substrates by radio-frequency sputtering were studied. Using ZnO:Al as buffer layer, an improvement in the InN structural properties was achieved. Evaluating ZnO:Al as contact on I
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cc59489929ed4acaa208050aa49700d3
https://doi.org/10.1002/pssa.200983725
https://doi.org/10.1002/pssa.200983725
Publikováno v:
Digital.CSIC. Repositorio Institucional del CSIC
instname
instname
Back reflectors based on Aluminum and Molybdenum as the reflecting materials and ZnO:Al as the transparent conductive oxide, were deposited at low temperature on polyethylene naphthalate by magnetron sputtering. The optimization of the layer thicknes
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::71866d91db617b3b7df015b5d001e74a
http://hdl.handle.net/10261/95206
http://hdl.handle.net/10261/95206
Publikováno v:
Sensors and Actuators A: Physical. 84:338-341
This paper presents the results obtained with a prototype of a magnetostrictive-piezoelectric magnetic sensor where the ferromagnetic material has been grown by sputtering over the piezoelectric support where a copper layer has been previously deposi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cc3e81d005093d43b7ddc1f583409abc
https://doi.org/10.1016/s0924-4247(00)00405-2
https://doi.org/10.1016/s0924-4247(00)00405-2
Mejora de las características de los sensores magnéticos de piezoeléctrico y material ferromagnético
Publikováno v:
Boletín de la Sociedad Española de Cerámica y Vidrio, Vol 38, Iss 6, Pp 673-676 (1999)
In this work we describe a new fabrication method for magnetostrictive-piezoelectric sensors that improve several characteristics. The mechanical coupling between the ferromagnetic and the piezoelectric has been optimised by means of a mixed method:
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::e2f8c056761e1e93247071d8dd4dd83b
https://doi.org/10.3989/cyv.1999.v38.i6.916
https://doi.org/10.3989/cyv.1999.v38.i6.916
Publikováno v:
Journal of Magnetism and Magnetic Materials. 316:462-464
In this work we present a study of the pinning field and coercivity of electrodeposited soft magnetic ( Co 76 P 24 / Co 85 P 15 ) N multilayered films. For f 1 kHz, a linear dependence of pinning field on N is reported, linear dependence which is val
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::06afe251368e1b06c694215cf09f8a60
https://doi.org/10.1016/j.jmmm.2007.03.173
https://doi.org/10.1016/j.jmmm.2007.03.173
Single-step electrochemical nanolithography of metal thin films by localized etching with an AFM tip
Publikováno v:
Nanotechnology. 19(32)
This work introduces electrochemical nanolithography (ENL), a single-step method in which a metal thin film is locally etched without application of a mask on a 100 nm length scale with an electrochemical atomic force microscope (AFM). The method req
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::f41a2dfcb00b49ff396ea664a54c7fc6
https://pubmed.ncbi.nlm.nih.gov/21828808
https://pubmed.ncbi.nlm.nih.gov/21828808
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