Zobrazeno 1 - 7
of 7
pro vyhledávání: '"O. T. Conard"'
Autor:
S. Van Elshocht, Wilfried Vandervorst, Annelies Delabie, Jerry Chen, Martin Green, J. Petry, Matty Caymax, O. Richard, S. De Gendt, Bert Brijs, Hugo Bender, V. Cosnier, O. T. Conard
Publikováno v:
2003 8th International Symposium Plasma- and Process-Induced Damage..
Targeting very thin equivalent oxides (
Autor:
O. T. Conard, O. Richard, Matty Caymax, Hugo Bender, S. Van Elshocht, J. Petry, Annelies Delabie, Wilfried Vandervorst, S. De Gendt, Bert Brijs
Publikováno v:
Materials Research Society symposium proceedings
Targeting very thin equivalent oxides (2, as silicate or mixed with Al2O3. In some cases nitrogen is added to improve the high-temperature stability. Depending on the deposition conditions ALD as well as MOCVD show serious deficiencies in terms of fi
Autor:
Caymax, Matty, Bender, H., Brijs, B., Conard, T., DeGendt, S., Delabie, A., Heyns, M., Onsia, B., Ragnarsson, L., Richard, O., Vandervorst, W., Elshocht, S. Van, Zhao, C., Maes, J. W., Daté, L., Pique, D., Young, E., Tsai, W., Shimamoto, Y.
Publikováno v:
MRS Online Proceedings Library; 2003, Vol. 765 Issue 1, p1-12, 12p
Autor:
Vandervorst, W., Brijs, B., Bender, H., Conard, O. T., Petry, J., Richard, O., Van Elshocht, S., Delabie, A., Caymax, M., De Gendt, S.
Publikováno v:
MRS Online Proceedings Library; 2002, Vol. 745 Issue 1, p1-11, 11p
Autor:
Cicerrella, E., Freeouf, J. L., Edge, L. F., Schlom, D. G., Heeg, T., Schubert, J., Chambers, S. A.
Publikováno v:
Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; 2005, Vol. 23 Issue 6, p1676-1680, 5p
Autor:
Triyoso, D. H., Hegde, R. I., Grant, J., Fejes, P., Liu, R., Roan, D., Ramon, M., Werho, D., Rai, R., La, L. B., Baker, J., Garza, C., Guenther, T., White, B. E., Tobin, P. J.
Publikováno v:
Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 2004, Vol. 22 Issue 4, p2121-2127, 7p
Publikováno v:
Applied Physics Letters; 8/18/2003, Vol. 83 Issue 7, p1400, 3p, 3 Graphs