Zobrazeno 1 - 10
of 95
pro vyhledávání: '"O. Schoen"'
Conference
Tento výsledek nelze pro nepřihlášené uživatele zobrazit.
K zobrazení výsledku je třeba se přihlásit.
K zobrazení výsledku je třeba se přihlásit.
Conference
Tento výsledek nelze pro nepřihlášené uživatele zobrazit.
K zobrazení výsledku je třeba se přihlásit.
K zobrazení výsledku je třeba se přihlásit.
Publikováno v:
Repositório Científico de Acesso Aberto de Portugal
Repositório Científico de Acesso Aberto de Portugal (RCAAP)
instacron:RCAAP
Repositório Científico de Acesso Aberto de Portugal (RCAAP)
instacron:RCAAP
InGaN layers are used as active layers of high brightness in nitride-based LEDs and lasers. Despite the progress in device development many of the fundamental optical properties are not completely understood. InGaN samples with different In content a
Publikováno v:
physica status solidi (a). 176:755-758
Conventional reactive ion etching of epitaxially grown GaN on (0001) sapphire substrate has been investigated using a basic chemistry of SiCl4, Ar and SF6. Photoresist or plasma-deposited SiNx were used for masking. The influence of gas flow, pressur
Publikováno v:
Le Journal de Physique IV. :Pr8-1035
Using production scale AIXTRON MOVPE reactors various heterostructures and quantum wells in the GaInN/GaN system have been studied. In an optimization from single quantun well strutures to 10 period multi quantum well structures the photoluminescence
Publikováno v:
Journal of Crystal Growth. 203:340-348
GaInN single layers were investigated in order to optimise their photoluminescence properties and to find dependencies on the main growth parameters such as growth temperature, In/(In+Ga) gas phase ratio and total pressure. Several approaches for cap
Publikováno v:
Journal of Crystal Growth. 195:297-303
We present some of the latest results obtained from single wafer horizontal tube reactors (AIX 200RF) and multiwafer planetary reactors ® (AIX 2000HT) as used for MOVPE of blue LEDs. The AIX 2000HT was set up in a configuration of 7×2″ which prov
Publikováno v:
Journal of Electronic Materials. 27:342-345
For the fabrication of epitaxial films of silicon carbide or the Group III nitrides, high growth temperatures (up to 1700°C) and fast heating and cooling of the growth environment have been found to be necessary. A range of production systems meetin
Publikováno v:
Journal of Electronic Materials. 26:1123-1126
Various Al-Ga-In Nitride alloys have been grown in AIXTRON Planetary Reactors®. GaN is grown with an excellent optical quality and very good thickness uniformity. GaInN with photoluminescence emission wavelengths in the visible blue region have also
Akademický článek
Tento výsledek nelze pro nepřihlášené uživatele zobrazit.
K zobrazení výsledku je třeba se přihlásit.
K zobrazení výsledku je třeba se přihlásit.