Zobrazeno 1 - 10
of 31
pro vyhledávání: '"O. Sarroukh"'
Autor:
C. Fleurier, Christophe Cachoncinlle, Raymond Viladrosa, Jozef Kaiser, Eric Robert, Jean-Michel Pouvesle, O. Sarroukh
Publikováno v:
Journal de Physique IV (Proceedings). 127:157-162
Les sources de rayonnement Extreme Ultraviolet (EUV) par decharge capillaire connaissent un interet de plus en plus considerable pour de nombreuses applications scientifiques et technologiques. Au GREMI, nous. etudions le fonctionnement des sources d
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a4e48e74d093c61b98cfb445fe9cb4b4
https://doi.org/10.1051/jp4:2005127024
https://doi.org/10.1051/jp4:2005127024
Autor:
Christophe Cachoncinlle, B. Métay, Moulay M. Idrissi, C. Fleurier, O. Sarroukh, R Viladrosa, J. Pons, T. Gonthiez, S.R. Mohanty, Jean-Michel Pouvesle, Eric Robert
Publikováno v:
Plasma Sources Science and Technology. 12:S43-S50
There is an increasing use of high energy photons in many fields of research and in industry. Where large installations such as synchrotrons or dedicated laser based source facilities can provide solutions for specific needs, they are presently unabl
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7f74699585ff9d66bf8feb5bde47b4db
https://doi.org/10.1088/0963-0252/12/4/319
https://doi.org/10.1088/0963-0252/12/4/319
Autor:
Eric Robert, C. Fleurier, A.L. Thomann, T. Gonthiez, Christophe Cachoncinlle, Jean-Michel Pouvesle, Raymond Viladrosa, O. Sarroukh
Publikováno v:
Journal de Physique IV (Proceedings). 108:259-262
Au GREMI, nous etudions le fonctionnement d'une lampe de rayonnement Extreme Ultraviolet (EUV) emettant a 13.5 nm : CAPELLA. Cette lampe consiste en une decharge capillaire dans un flux de xenon continu a basse pression. L'utilisation de Xenon a bass
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bd175795058af4958d5d4610544bcbf9
https://doi.org/10.1051/jp4:20030639
https://doi.org/10.1051/jp4:20030639
Autor:
Raymond Viladrosa, Jean-Michel Pouvesle, T. Gonthiez, Christophe Cachoncinlle, Eric Robert, O. Sarroukh, C. Fleurier
Publikováno v:
Journal de Physique IV (Proceedings). 108:169-172
Dans ce travail, nous presentons les caracteristiques de la lampe a decharge capillaire Capella. Cette source de rayonnement EUV peut produire un flux de photon superieur au Watt (2% BW, 13.5 nm) avec un rendement a la prise de courant de plus de 0.1
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5b141510674be9de92c1e20add3aee3f
https://doi.org/10.1051/jp4:20030620
https://doi.org/10.1051/jp4:20030620
Publikováno v:
UVX 2012 - 11e Colloque sur les Sources Cohérentes et Incohérentes UV, VUV et X ; Applications et Développements Récents.
Depuis Plusieurs annees, les sources de rayonnement Extreme Ultraviolet (EUV) suscitent un interet de plus en plus considerable pour de nombreuses applications scientifiques et technologiques. A Eppra, nous developpons une source de rayonnement nomme
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::470314cc7d6f47cb7bc5ba42402cd1fe
https://doi.org/10.1051/uvx/201301002
https://doi.org/10.1051/uvx/201301002
Autor:
K. Powell, G. Duffy, P. Choi, R. Aliaga-Rossel, O. Benali, H. Keles, B. Lebert, O. Sarroukh, L. Tantart, C. Zaepffel, A. Michette, Ian McNulty, Catherine Eyberger, Barry Lai
Publikováno v:
AIP Conference Proceedings.
Soft x‐ray microscopy is an attractive tool for the study of biological samples in‐vitro, due to the penetrating nature of x‐rays and the natural contrast which can be achieved in hydrated samples. There has been a roadblock to the commercialis
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7ac4841c2c11ed3bd31290a3266432b5
https://doi.org/10.1063/1.3625321
https://doi.org/10.1063/1.3625321
Autor:
Christophe Cachoncinlle, R Viladrosa, Jean-Michel Pouvesle, S.R. Mohanty, Eric Robert, O. Sarroukh, T. Gonthiez, C. Fleurier
Publikováno v:
Conference Record of the Twenty-Fifth International Power Modulator Symposium, 2002 and 2002 High-Voltage Workshop..
A xenon filled capillary discharge has been developed for efficient EUV radiation production with emphasis on the wavelength range around 13.5 nm in view of application to EUV lithography. This source will be operated in a multi-watt, kHz and low deb
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::148f4a58b7c4bb10d577b8a37c1879b7
https://doi.org/10.1109/modsym.2002.1189547
https://doi.org/10.1109/modsym.2002.1189547
Autor:
O. Sarroukh, Christophe Cachoncinlle, T. Gonthiez, Eric Robert, Jean-Michel Pouvesle, A.L. Thomann, Raymond Viladrosa, C. Fleurier
Publikováno v:
IEEE Conference Record - Abstracts. 2002 IEEE International Conference on Plasma Science (Cat. No.02CH37340).
Summary form only given, as follows. We have developed xenon discharge plasma sources dedicated to EUV lithography and to EUV metrology. Few kA currents with fast rise time and short duration have been applied across xenon filled ceramics capillary (
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7220ce59c96d64cc676a543bb307d863
https://doi.org/10.1109/plasma.2002.1030356
https://doi.org/10.1109/plasma.2002.1030356
Autor:
Eric Robert, Raymond Viladrosa, Christophe Cachoncinlle, C. Fleurier, Jean-Michel Pouvesle, T. Gonthiez, O. Sarroukh, A.L. Thomann
Publikováno v:
Emerging Lithographic Technologies VI.
The development and operation of a multi watt, multi kHz and low debris EUV gas discharge source is reported. The Capillary EUV Lamp for Lithography Approach (CAPELLA) is designed and characterized for its application in the french EUV exposure tool
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::dde748bc9a28339fc00b7b6ac6d66582
https://doi.org/10.1117/12.472276
https://doi.org/10.1117/12.472276
Autor:
Miroslava Vrbová, C. Cachoncinlle, J. M. Pouvesle, E. Robert, O. Sarroukh, C. Fleurier, Pavel Vrba, Pavel V. Sasorov, R. Villadrosa, N. A. Bobrova, T. Gonthiez
Publikováno v:
ResearcherID
Xenon filled fast capillary discharge is studied as a source of intense EUV radiation. Experiments are performed with GREMI apparatus. One‐dimensional two temperatures MHD code is used to evaluate time and radial dependences of capillary plasma pro
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::94049d075280b8d18ac75a54b29cc632
https://doi.org/10.1063/1.1521010
https://doi.org/10.1063/1.1521010