Zobrazeno 1 - 10
of 53
pro vyhledávání: '"O. Durand-Drouhin"'
Autor:
L. Chahed, J.D. Sib, Andreas Zeinert, Y. Bouizem, K. Zellama, O. Durand-Drouhin, M. Clin, D. Benlakehal, A. Belfedal, R. Baghdad
Publikováno v:
Materials Science in Semiconductor Processing. 26:231-237
The correlation between the surface roughness and optoelectronic properties of a series of intrinsic and doped nanocrystalline silicon samples deposited by rf-magnetron sputtering at low temperature has been deduced from atomic force microscopy, spec
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7c3de9da7b56a5332f4195272ec41eb7
https://doi.org/10.1016/j.mssp.2014.04.033
https://doi.org/10.1016/j.mssp.2014.04.033
Autor:
O. Durand-Drouhin, Habib Bouchriha, C. Manaa, Michael Lejeune, F. Kouki, K. Zellama, M. Benlahsen
Publikováno v:
Thin Solid Films. 560:55-58
We investigate in the present study the effects of the radio-frequency plasma power on the opto-electronical properties of the polymeric amorphous hydrogenated carbon thin films deposited at room temperature and different radio-frequency powers by pl
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fce353acf7384e9142bd61cf390d8edb
https://doi.org/10.1016/j.tsf.2013.11.118
https://doi.org/10.1016/j.tsf.2013.11.118
Autor:
Fabien Alibart, S. Elizabeth Rodil, L. Escobar-Alarcón, Stephen Muhl, M. Benlahsen, Enrique Camps, O. Durand Drouhin
Publikováno v:
Applied Surface Science. 254:5564-5568
Amorphous carbon nitride (a-CN x ) thin films have been synthesised by three different deposition techniques in an Ar/N 2 gas mixture and have been deposited by varying the percentage of nitrogen gas in the mixture (i.e. the N 2 /Ar + N 2 ratio) from
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bfc84a65421cc6733d6d31447a408e48
https://doi.org/10.1016/j.apsusc.2008.02.108
https://doi.org/10.1016/j.apsusc.2008.02.108
Publikováno v:
Solid State Communications. 145:392-396
Amorphous carbon nitride films ( CN x ) were grown by reactive radio-frequency (RF) magnetron sputtering of a high-purity graphite target in argon/nitrogen (Ar/ N 2 ) gas mixture. The total discharge pressure was 1 Pa and the total nitrogen partial p
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4a5c9f7bcc8816e33fdb6516942633da
https://doi.org/10.1016/j.ssc.2007.11.025
https://doi.org/10.1016/j.ssc.2007.11.025
Publikováno v:
Diamond and Related Materials. 13:1854-1858
Spectroscopic investigations of amorphous carbon nitride thin films (a-CN x ) deposited by radio-frequency (RF) magnetron sputtering on (100) silicon wafers, under different RF power, are reported. The local bonding in the a-CN x films was analyzed b
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::14627654be9a08b91259ba1f536b3941
https://doi.org/10.1016/j.diamond.2004.05.005
https://doi.org/10.1016/j.diamond.2004.05.005
Autor:
M Benlahsen, O Durand-Drouhin
Publikováno v:
Solid State Communications. 131:425-429
Analysis of amorphous carbon nitride thin films (a-CNx) deposited by RF magnetron sputtering on (100) silicon wafers under different target self-bias (Vb) is reported. The a-CNx films composition and microstructure have been determined combining many
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9e11ff8accc2aa3ea746681b90f67228
https://doi.org/10.1016/j.ssc.2004.06.013
https://doi.org/10.1016/j.ssc.2004.06.013
Publikováno v:
Applied Surface Science. 223:269-274
We report in this study a deposition mechanism that describes the interaction of plasma species with the growing amorphous carbon nitride film (a-CN x ). The samples were deposited by radio frequency (rf) magnetron sputtering on crystalline silicon,
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::77d47cc3b22bca5b1a0560b8522a6d62
https://doi.org/10.1016/j.apsusc.2003.09.017
https://doi.org/10.1016/j.apsusc.2003.09.017
Publikováno v:
Thin Solid Films. 444:1-8
Analysis of carbon nitride films (CN x ) deposited by radio frequency (RF) magnetron sputtering on crystalline silicon, under different target self-bias, is reported. Plasma characterisation was performed using mass spectroscopy (MS) and the properti
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3ac9a569adba3a1c215b508bf7f349ea
https://doi.org/10.1016/s0040-6090(03)00902-7
https://doi.org/10.1016/s0040-6090(03)00902-7
Publikováno v:
Surface and Coatings Technology. :260-266
Mechanical properties and failure modes of TiAlN and TiAlSiN single layer and multilayer thin films were investigated by nanoindentation measurements. It was found that alloying of silicon into TiAlN single layer led to a significant increase of hard
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8af186f5fa50b5ba9c16a86d6e9ad027
https://doi.org/10.1016/s0257-8972(02)00609-6
https://doi.org/10.1016/s0257-8972(02)00609-6
Publikováno v:
Surface and Coatings Technology. :242-246
Analysis of carbon nitride films (CN x ) deposited by RF magnetron sputtering on (100 ) silicon wafers, under different targetself-bias, is reported. The properties of as-deposited films were determined using X-ray photoelectron spectroscopy (XPS ),I
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d46e4b88b0fa9bc6357a0ea4f9dc48fe
https://doi.org/10.1016/s0257-8972(01)01659-0
https://doi.org/10.1016/s0257-8972(01)01659-0