Zobrazeno 1 - 10
of 42
pro vyhledávání: '"O. Dorsch"'
Publikováno v:
Diamond and Related Materials. 5:644-648
An accurate technique to measure the thermal conductivity k(T) of CVD diamond based on new micromechanical devices is presented. The thermal conductivity parallel to the surface of films with thicknesses ranging from 2 to several hundred μm can be d
Autor:
Colin Johnston, Matthew Werner, E. Obermeier, Paul R. Chalker, H. U. Baerwind, S. Romani, O. Dorsch
Publikováno v:
IEEE Transactions on Electron Devices. 42:1344-1351
Three metallization schemes, namely Al/Si, Ti-Au and TiWN-Au contacts on B-doped polycrystalline diamond films have been compared. After annealing at 450/spl deg/C in nitrogen Al/Si contacts show the lowest contact resistivity in the order of /spl si
Publikováno v:
Diamond and Related Materials. 4:873-876
Pressure sensors with boron-doped, mesa-etched polycrystalline diamond piezoresistors on top of a silicon square membrane (1300 μm × 1300 μm × 30 μm) were manufactured. Electrical insulation of the boron-doped piezoresistors from the silicon sub
Publikováno v:
Diamond and Related Materials. 4:456-459
This paper describes etching of polycrystalline diamond films by reactive ion etching (RIE) in an O2 plasma. The RIE patterned films showed anisotropic etching profiles. During RIE, columnar structures were created on the etched surface., Changes in
Autor:
E. Obermeier, K. Holzner, I.M. Buckley-Golder, Paul R. Chalker, R.E. Harper, Colin Johnston, M. Werner, O. Dorsch
Publikováno v:
Scopus-Elsevier
Double-layer structures consisting of a nominally undoped diamond film and an overlying boron-doped diamond film on Si substrates were used for investigations into the piezoresistive effect of polycrystalline diamond films. Various resistor structure
Publikováno v:
Diamond and Related Materials. 1:277-280
Amorphous carbon films and doped and undoped polycrystalline diamond films were patterned with RIE in an oxygen plasma. Insitu measurement of the etch rate gave different, depth-dependent etch rate values. For the amorphous films, an etch rate of 150
Autor:
O, Dorsch
Publikováno v:
Deutsche medizinische Wochenschrift (1946). 133(16)
Akademický článek
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Autor:
H. U. Baerwind, Colin Johnston, A. Ersoy, O. Dorsch, V. Moore, S. Romani, Paul R. Chalker, E. Obermeier, M. Werner, I.M. Buckley-Golder
Publikováno v:
Scopus-Elsevier
The effects on the contact resistivity of annealing Al Si (99:1) contacts on diamond with different B concentrations have been investigated. The change of the current-voltage characteristic from rectifying to ohmic on lightly doped samples, and the d
Autor:
Paul R. Chalker, E. Obermeier, L. Haase, O. Dorsch, W. Seifert, Hugh E. Bishop, Matthew Werner, H. U. Baerwind, Colin Johnston, Simon Romani, A. Ringhandt
Publikováno v:
Applied Physics Letters. 64:595-597
Temperature‐dependent conductivity and Hall measurements have been carried out on heavily in situ B‐doped polycrystalline diamond films in a temperature range from ∼100 to 750 K. The slope of the conductivity is clearly non‐Arrhenius leading