Zobrazeno 1 - 10
of 44
pro vyhledávání: '"O. Brux"'
Autor:
Diane Coomans
Publikováno v:
Chronique d'Egypte, 95 (189
SCOPUS: re.j
info:eu-repo/semantics/published
info:eu-repo/semantics/published
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::4edad418d8a74aa3bd26b17726854efb
https://doi.org/10.1484/j.cde.5.123024
https://doi.org/10.1484/j.cde.5.123024
Akademický článek
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Autor:
Alain Delattre
Publikováno v:
Chronique d'Egypte. 77:361-368
Edition d'un recu de taxe copte inedit des Musees royaux d'Art et d'Histoire de Bruxelles. Reedition de deux recus de taxe similaires. Corrections a d'autres textes deja edites. Les documents proviennent de la region thebaine et datent de la premiere
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::739dec398caa41c672bfa190f5aabd76
https://doi.org/10.1484/j.cde.2.309208
https://doi.org/10.1484/j.cde.2.309208
Autor:
K. A. Worp, Henri Melaerts
Publikováno v:
Chronique d'Egypte. 74:197-199
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::dcac526cb5e456b1fcfcecb53f3ca61b
https://doi.org/10.1484/j.cde.2.309103
https://doi.org/10.1484/j.cde.2.309103
Autor:
Delattre, Alain
Publikováno v:
Chronique d'Egypte, 77 (153-154
Édition d'un reçu de taxe copte inédit des Musées royaux d'Art et d'Histoire de Bruxelles. Réédition de deux reçus de taxe similaires. Corrections à d'autres textes déjà édités. Les documents proviennent de la région thébaine et datent
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=od______2101::cbdd1b6bb463e67b80abac2a991486b7
http://hdl.handle.net/2013/ULB-DIPOT:oai:dipot.ulb.ac.be:2013/43449
http://hdl.handle.net/2013/ULB-DIPOT:oai:dipot.ulb.ac.be:2013/43449
Autor:
Melaerts, Henri, Worp, K. A.
Publikováno v:
Chronique d'Egypte; January 1999, Vol. 74 Issue: 147 p197-199, 3p
Publikováno v:
Photomask Technology 2011, 19 September 2011 through 22 September 2011, Monterey, CA, USA., 8166
Extreme Ultraviolet Lithography (EUVL) is the most promising solution for technology nodes 16nm (hp) and below. However, several unique EUV mask challenges must be resolved for a successful launch of the technology into the market. Uncontrolled intro
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::89170014f084f26762816c255371d155
https://doi.org/10.1117/12.896908
https://doi.org/10.1117/12.896908
Publikováno v:
La Fontaine, B.M.Naulleau, P.P., Extreme Ultraviolet (EUV) Lithography II, 28 February 2011 through 3 March 2011, San Jose, CA. Conference code: 85007, 7969, 79691Q-1-79691Q-10
Before new equipment for handling of EUV reticles can be used, it should be shown that the apparatus is qualified for operating at a sufficiently clean level. TNO developed a qualification procedure that is separated into two parts: reticle handling
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::f62e0003d80d63e742b32e6670683a64
https://doi.org/10.1117/12.879370
https://doi.org/10.1117/12.879370