Zobrazeno 1 - 10
of 116
pro vyhledávání: '"O V, Aleksandrov"'
Autor:
O. V. Aleksandrov
Publikováno v:
Історія науки і техніки, Vol 8, Iss 1(12), Pp 5-11 (2018)
У статті розглядається особистий внесок видатного інженера і вченого в області теплотехніки, почесного академіка В. Г. Шухова в розвито
Externí odkaz:
https://doaj.org/article/eb90239f0d9b4389bcec6c0f1c5350f8
Autor:
O. V. Aleksandrov
Publikováno v:
Semiconductors. 56:241-245
Publikováno v:
Semiconductors. 56:160-163
Autor:
O. V. Aleksandrov
Publikováno v:
Semiconductors. 55:578-582
Autor:
O. V. Aleksandrov
Publikováno v:
Semiconductors. 55:207-213
The effect of the intensity of ionizing radiation on the volume charge and surface-state density of metal—oxide—semiconductor (MOS) structures with thin gate silicon dioxide is modeled. It is shown that the dependences of the surface-state densit
Autor:
O. V. Aleksandrov
Publikováno v:
Vestnik MGIMO-Universiteta, Vol 0, Iss 3(30), Pp 12-17 (2013)
This article deals with the Arctic strategy of the European Union. The main task of the author is to show the development of the EU’s Arctic policy during the previous 5 years, to analyze motivations of the EU’s actions in the Arctic, to assess t
Externí odkaz:
https://doaj.org/article/0bcaee9a37f74a5b9a3f2af7e35cb967
Autor:
O. V. Aleksandrov
Publikováno v:
Vestnik MGIMO-Universiteta, Vol 0, Iss 2(29), Pp 18-23 (2013)
This article is devoted to a problem of security of the Arctic region. The author portrays the contemporary state of the Arctic region, indicates changes which happened in the region after the end of "the cold war", analyzes the role which regional a
Externí odkaz:
https://doaj.org/article/91fe1685eabc4eb9b7859adcfcb00049
Autor:
O. V. Aleksandrov
Publikováno v:
Semiconductors. 54:1215-1219
It is shown that the description of the dispersive transport of H+ ions, based on the multi-trapping model, allows quantitative description of the kinetics of surface-state formation in metal-oxide-semiconductor (MOS) structures after exposure to ion
Autor:
O. V. Aleksandrov
Publikováno v:
Semiconductors. 54:233-239
A new quantitative model of the negative-bias temperature instability (NBTI) of p-MOS (metal-oxide-semiconductor) transistors is developed. The model is based on the reaction of the depassivation of surface states at the Si–SiO2 interphase boundary
Autor:
S. A. Mokrushina, O. V. Aleksandrov
Publikováno v:
Semiconductors. 54:240-245
A new quantitative model of the effect of the gate bias on the threshold voltage of metal-oxide-semiconductor (MOS) structures under ionizing irradiation is developed based on the consideration of hole trapping from the entire volume of the gate diel