Zobrazeno 1 - 10
of 24
pro vyhledávání: '"O O Versolato"'
Autor:
F. Torretti, J. Sheil, R. Schupp, M. M. Basko, M. Bayraktar, R. A. Meijer, S. Witte, W. Ubachs, R. Hoekstra, O. O. Versolato, A. J. Neukirch, J. Colgan
Publikováno v:
Nature Communications, Vol 11, Iss 1, Pp 1-8 (2020)
Extreme ultraviolet (EUV) light is entering use in nanolithography. Here the authors discuss experimental and theoretical results about the prominent role of multiply-excited states in highly charged tin ions in the mechanism of EUV light emission fr
Externí odkaz:
https://doaj.org/article/6a95599c1e5e4450b7df90e19506645e
Autor:
Z. Bouza, J. Byers, J. Scheers, R. Schupp, Y. Mostafa, L. Behnke, Z. Mazzotta, J. Sheil, W. Ubachs, R. Hoekstra, M. Bayraktar, O. O. Versolato
Publikováno v:
AIP Advances, Vol 11, Iss 12, Pp 125003-125003-8 (2021)
We present a calibrated spectrum in the 5.5–265.5 nm range from a microdroplet-tin Nd:YAG-laser-produced plasma under conditions relevant for the production of extreme ultraviolet (EUV) light at 13.5 nm for nanolithography. The plasma emission spec
Externí odkaz:
https://doaj.org/article/c153071acac5497b9b64aa45cfd1ac54
Autor:
R. A. Meijer, D. Kurilovich, B. Liu, Z. Mazzotta, J. Hernandez-Rueda, O. O. Versolato, S. Witte
Publikováno v:
Meijer, R A, Kurilovich, D, Liu, B, Mazzotta, Z, Hernandez-Rueda, J, Versolato, O O & Witte, S 2022, ' Nanosecond laser ablation threshold of liquid tin microdroplets ', Applied Physics A: Materials Science and Processing, vol. 128, no. 7, 570, pp. 1-8 . https://doi.org/10.1007/s00339-022-05685-9
Applied Physics A: Materials Science and Processing, 128(7):570, 1-8. Springer Heidelberg
Applied Physics A: Materials Science and Processing, 128(7):570, 1-8. Springer Heidelberg
The laser ablation threshold is an important parameter that governs the response of materials to intense laser irradiation. Here we study the ablation threshold of liquid tin, by irradiating tin microdroplets with nanosecond laser pulses having finel
Autor:
S Rai, K I Bijlsma, L Poirier, E de Wit, L Assink, A Lassise, I Rabadán, L Méndez, J Sheil, O O Versolato, R Hoekstra
Publikováno v:
Plasma Sources Science and Technology, 32(3):035006, 1-8. IOP Publishing Ltd.
Plasma Sources Science and Technology, 32(3):035006. IOP PUBLISHING LTD
Rai, S, Bijlsma, K I, Poirier, L, de Wit, E, Assink, L, Lassise, A, Rabadán, I, Méndez, L, Sheil, J, Versolato, O O & Hoekstra, R 2023, ' Evidence of production of keV Sn + ions in the H 2 buffer gas surrounding an Sn-plasma EUV source ', Plasma Sources Science and Technology, vol. 32, no. 3, 035006, pp. 1-8 . https://doi.org/10.1088/1361-6595/acc274
Plasma Sources Science and Technology, 32(3):035006. IOP PUBLISHING LTD
Rai, S, Bijlsma, K I, Poirier, L, de Wit, E, Assink, L, Lassise, A, Rabadán, I, Méndez, L, Sheil, J, Versolato, O O & Hoekstra, R 2023, ' Evidence of production of keV Sn + ions in the H 2 buffer gas surrounding an Sn-plasma EUV source ', Plasma Sources Science and Technology, vol. 32, no. 3, 035006, pp. 1-8 . https://doi.org/10.1088/1361-6595/acc274
Charge-state-resolved kinetic energy spectra of Sn ions ejected from a laser-produced plasma (LPP) of Sn have been measured at different densities of the H2 buffer gas surrounding a micro-droplet LPP. In the absence of H2, energetic keV Sn ions with
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::be4bd2534050072d0906b337929883b7
https://doi.org/10.1088/1361-6595/acc274
https://doi.org/10.1088/1361-6595/acc274
Publikováno v:
Physics of Plasmas. 30
We characterize the properties of extreme ultraviolet (EUV) light source plasmas driven by laser wavelengths in the λ laser = 1.064 − 10.6 μ m range and laser intensities of I laser = 0.5 − 5 × 10 11 W cm−2 for λ laser = 1.064 μ m. Detaile
Autor:
R. Schupp, L. Behnke, J. Sheil, Z. Bouza, M. Bayraktar, W. Ubachs, R. Hoekstra, O. O. Versolato
Publikováno v:
Physical Review Research, Vol 3, Iss 1, p 013294 (2021)
Experimental spectroscopic studies are presented, in a 5.5–25.5 nm extreme-ultraviolet (EUV) wavelength range, of the light emitted from plasma produced by the irradiation of tin microdroplets by 5-ns-pulsed, 2-μm-wavelength laser light. Emission
Externí odkaz:
https://doaj.org/article/68ecc136d37a433d8a6e988b0a935c49
Publikováno v:
Versolato, O O, Sheil, J, Witte, S, Ubachs, W & Hoekstra, R 2022, ' Microdroplet-tin plasma sources of EUV radiation driven by solid-state-lasers (Topical Review) ', Journal of Optics (United Kingdom), vol. 24, no. 5, 054014, pp. 1-12 . https://doi.org/10.1088/2040-8986/ac5a7e
Plasma produced from molten-tin microdroplets generates extreme ultraviolet light for state-of-the-art nanolithography. Currently, CO2 lasers are used to drive the plasma. In the future, solid-state mid-infrared lasers may instead be used to efficien
Autor:
S. Rai, K. I. Bijlsma, I. Rabadán, L. Méndez, P. A. J. Wolff, M. Salverda, O. O. Versolato, R. Hoekstra
Publikováno v:
Physical Review A. 106
Autor:
L. Poirier, A. Lassise, Y. Mostafa, L. Behnke, N. Braaksma, L. Assink, R. Hoekstra, O. O. Versolato
Publikováno v:
Applied Physics B-Lasers and Optics, 128(7):135. SPRINGER
Applied Physics B: Lasers and Optics, 128(7):135. SPRINGER
Applied Physics B: Lasers and Optics, 128(7):135, 1-7. Springer Verlag
Poirier, L, Lassise, A, Mostafa, Y, Behnke, L, Braaksma, N, Assink, L, Hoekstra, R & Versolato, O O 2022, ' Energy-and charge-state-resolved spectrometry of tin laser-produced plasma using a retarding field energy analyzer ', Applied Physics B: Lasers and Optics, vol. 128, no. 7, 135, pp. 1-7 . https://doi.org/10.1007/s00340-022-07844-5
Applied Physics B: Lasers and Optics, 128(7):135. SPRINGER
Applied Physics B: Lasers and Optics, 128(7):135, 1-7. Springer Verlag
Poirier, L, Lassise, A, Mostafa, Y, Behnke, L, Braaksma, N, Assink, L, Hoekstra, R & Versolato, O O 2022, ' Energy-and charge-state-resolved spectrometry of tin laser-produced plasma using a retarding field energy analyzer ', Applied Physics B: Lasers and Optics, vol. 128, no. 7, 135, pp. 1-7 . https://doi.org/10.1007/s00340-022-07844-5
We present a method to obtain the individual charge-state-dependent kinetic-energy distributions of tin ions emanating from a laser-produced plasma from their joint overlapping energy distributions measured by means of a retarding field energy analyz
Autor:
L. Poirier, A. Bayerle, A. Lassise, F. Torretti, R. Schupp, L. Behnke, Y. Mostafa, W. Ubachs, O. O. Versolato, R. Hoekstra
Publikováno v:
Poirier, L, Bayerle, A, Lassise, A, Torretti, F, Schupp, R, Behnke, L, Mostafa, Y, Ubachs, W, Versolato, O O & Hoekstra, R 2022, ' Cross-calibration of a combined electrostatic and time-of-flight analyzer for energy-and charge-state-resolved spectrometry of tin laser-produced plasma ', Applied Physics B: Lasers and Optics, vol. 128, no. 3, 39, pp. 1-11 . https://doi.org/10.1007/s00340-022-07767-1
Applied Physics B: Lasers and Optics, 128(3):39. SPRINGER
Applied Physics B: Lasers and Optics, 128(3):39, 1-11. Springer Verlag
Applied Physics B: Lasers and Optics, 128(3):39. SPRINGER
Applied Physics B: Lasers and Optics, 128(3):39, 1-11. Springer Verlag
We present the results of the calibration of a channeltron-based electrostatic analyzer operating in time-of-flight mode (ESA-ToF) using tin ions resulting from laser-produced plasma, over a wide range of charge states and energies. Specifically, the