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Development of the Nitrogen Fixation System for CELSS

Autor: Inoue, M., Iiyama, S., Numaguchi, T., Kikuchi, K., Nitta, K.

Publikováno v: SAE Transactions, 1992 Jan 01. 101, 801-806.

Externí odkaz: https://www.jstor.org/stable/44733035

Avoiding low flow conditions for filters used in wet cleaning processes.

Autor: Hashimoto, M., Tsuzuki, S., Numaguchi, T., Miyazaki, N.

Publikováno v: 2011 International Symposium on Semiconductor Manufacturing (ISSM) & e-Manufacturing & Design Collaboration Symposium (eMDC); 2011, p1-10, 10p

Effective start up study and factor analysis for lithography process filter.

Autor: Umeda, T., Tsuzuki, S., Numaguchi, T.

Publikováno v: 2010 International Symposium on Semiconductor Manufacturing (ISSM); 2010, p1-4, 4p

New methods for measuring resistance and charge decay of worksurfaces.

Autor: Uchida, H., Kurosaki, H., Numaguchi, T.

Publikováno v: Electrical Overstress/Electrostatic Discharge Symposium Proceedings 2000 (IEEE Cat. No.00TH8476); 2000, p152-160, 9p