Zobrazeno 1 - 10
of 12
pro vyhledávání: '"Nozomu Izumi"'
Autor:
Takaaki Terashi, Manabu Hakko, Miwako Ando, Nozomu Izumi, Takeo Oyanagi, Yoshinori Osaki, Nobuhiko Yabu, Toru Okubo
Publikováno v:
SID Symposium Digest of Technical Papers. 52:99-102
Autor:
Toru Okubo, Koichi Takasaki, Nozomu Izumi, Miwako Ando, Manabu Hakko, Kouhei Nagano, Nobuhiko Yabu, Takaaki Terashi, Yoshinori Osaki, Takeo Oyanagi
Publikováno v:
SID Symposium Digest of Technical Papers. 51:204-207
Autor:
Toru Okubo, Manabu Hakko, Nobuhiko Yabu, Kazuki Toyoda, Miwako Ando, Takeo Oyanagi, Yusuke Miyoshi, Ryousuke Fukuoka, Nozomu Izumi, Fumiyasu Ono, Takaaki Terashi, Yoshinori Osaki
Publikováno v:
Proceedings of the International Display Workshops. :319
Publikováno v:
SID Symposium Digest of Technical Papers. 50:769-772
Publikováno v:
Journal of the Society for Information Display. 27:265-272
Publikováno v:
Optical Microlithography XXXIII.
Markets continuously demand higher resolution and higher productivity in flat panel display (FPD) exposure systems. Our solution to improve resolution and productivity is the use of broadband wavelength illumination. A larger depth of focus (DOF) is
Publikováno v:
Proceedings of the International Display Workshops. :228
Autor:
Koichi Takasaki, Kouhei Nagano, Kanji Suzuki, Nozomu Izumi, Nobuhiko Yabu, Manabu Hakko, Miwako Ando
Publikováno v:
Proceedings of the International Display Workshops. :713
Publikováno v:
Journal of the Society for Information Display. 23:246-252
Using shorter wavelength for exposure light is one way to achieve high resolution while keeping sufficient depth of focus. We show exposure results for high resolution to confirm the effect of deep UV exposure light. With deep UV light, 1.2-µm line
Publikováno v:
Journal of the Japan Institute of Metals. 66:929-934