Zobrazeno 1 - 10
of 167
pro vyhledávání: '"Noriyoshi SATO"'
Autor:
Noriyoshi Sato
Publikováno v:
Industrial Plasma Technology: Applications from Environmental to Energy Technologies
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::00422ef26b55dd81c8bccaaaab9b260d
https://doi.org/10.1002/9783527629749.ch34
https://doi.org/10.1002/9783527629749.ch34
Autor:
Ferdinand Jamitzky, Christian Linsmeier, Tetsuji Shimizu, Wolfgang Jacob, Noriyoshi Sato, Stefan Lindig, Satoshi Shimizu, B. M. Annaratone, Robert W. Stark, Hubertus M. Thomas, Gregor E. Morfill
Publikováno v:
Applied Surface Science. 254:177-180
We demonstrate the approach of diamond growth on levitating seed particles in a rf plasma. We introduce a hot filament chemical vapor deposition (CVD) technique into the rf plasma chamber in order to obtain improved crystal growth. Firstly, we confir
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::550e66b7c85ed4786f9ef6ba00075af7
https://doi.org/10.1016/j.apsusc.2007.07.017
https://doi.org/10.1016/j.apsusc.2007.07.017
Autor:
Reina Ohmukai, Tomonori Miura, Seiji Mukaigawa, Noriyoshi Sato, Tamiya Fujiwara, Koichi Takaki, Hiroshi Mase
Publikováno v:
Japanese Journal of Applied Physics. 45:1797-1800
Capacity-coupled multi-discharge (CCMD), which is essentially a self-quenching discharge in a manner similar to dielectric barrier discharge (DBD), has recently been developed as an atmospheric pressure plasma source. A coaxial cable is employed as a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::69854c9adfa5706ddcc62d86d00fff80
https://doi.org/10.1143/jjap.45.1797
https://doi.org/10.1143/jjap.45.1797
Publikováno v:
Thin Solid Films. 457:285-291
To suppress inclusion of fine particles in amorphous silicon films, a negatively-charged fine particle (NFP) collector has been successfully installed in a silane plasma. Two modes of operation of the NFP collector biasing were examined: (i) turning
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::660530df1bb2d5e1a0769ada47479b50
https://doi.org/10.1016/j.tsf.2003.11.300
https://doi.org/10.1016/j.tsf.2003.11.300
Publikováno v:
Plasma Sources Science and Technology. 12:S21-S25
We report a new method for the nucleation and growth of diamonds by employing an electron-temperature control technique in CH4/H2 radio frequency glow discharge plasma under a low gas pressure of 100 mTorr. The electron temperature in the plasma is c
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d0c0eceb24af5be7685fbc08c15a60b0
https://doi.org/10.1088/0963-0252/12/4/316
https://doi.org/10.1088/0963-0252/12/4/316
Publikováno v:
Diamond and Related Materials. 12:374-377
Dynamic behaviors of fine diamond-particles levitated in low-pressure plasmas are investigated. Fine diamond-particles injected into the plasma are charged up negatively and confined electrically above a radio frequency (RF) powered electrode at some
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6347fc7323ae261d0a0357e00085225f
https://doi.org/10.1016/s0925-9635(02)00289-3
https://doi.org/10.1016/s0925-9635(02)00289-3
Publikováno v:
Physics of plasmas. 9(4):1271-1276
It is clearly demonstrated by means of two-and-a-half-dimensional particle simulations that a plasma potential structure is created by local electron cyclotron resonance (ECR) in a plasma flow along a well-shaped magnetic field. The potential structu
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::ea4906d24d108cfc096edae91432f952
http://hdl.handle.net/10097/35483
http://hdl.handle.net/10097/35483
Publikováno v:
Thin Solid Films. 407:192-197
A large-area rectangular modified-magnetron-type (MMT) radio frequency (RF) plasma source is newly developed and the properties are investigated in detail for producing a large-area uniform plasma. A quite uniform plasma with density variation less t
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b89816f905266cc7aabf048b0283df54
https://doi.org/10.1016/s0040-6090(02)00037-8
https://doi.org/10.1016/s0040-6090(02)00037-8
Autor:
Ichihito Narita, Naoyuki Sato, Takeo Oku, Tetsu Mieno, Takamichi Hirata, Noriyoshi Sato, Rikizo Hatakeyama
Publikováno v:
Diamond and Related Materials. 11:935-939
Endohedral fullerenes Si@C 74 were produced by direct current and radio-frequency hybrid arc-discharge. Atomic structure analysis and structural optimization of the Si@C 74 were carried out by high-resolution electron microscopy, image simulation, mo
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9fd4deac38c4e0801425bbd09f49cb37
https://doi.org/10.1016/s0925-9635(01)00604-5
https://doi.org/10.1016/s0925-9635(01)00604-5
Publikováno v:
Thin Solid Films. 407:7-11
Effects of electron temperature ( T e ) on the quality of deposited silicon thin film were investigated using a modified magnetron typed plasma source equipped with a T e control system. Two kinds of Si films were prepared; amorphous silicon (a-Si:H)
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::34bcffabd107f4e6b477a64bcd19edfe
https://doi.org/10.1016/s0040-6090(02)00004-4
https://doi.org/10.1016/s0040-6090(02)00004-4