Zobrazeno 1 - 6 of 6 pro vyhledávání: '"Norio Moriike"'
1
Analysis of pattern collapse of ArF excimer laser resist by direct peeling method with atomic force microscope tip
Autor: Akira Kawai, Norio Moriike
Publikováno v: Microelectronic Engineering. :683-692
Quantitative analysis of the collapse property of dot resist pattern formed by ArF excimer laser lithography ranging from 141 to 405 nm diameter and 360 nm height is demonstrated experimentally. By directly applying a load to a top corner of the resi
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::42651568deb0db030140023e8cb25c33
https://doi.org/10.1016/s0167-9317(01)00452-x
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2
Adhesion and Cohesion Analysis of ArF/SOR Resist Patterns with Microtip of Atomic Force Microscope(AFM)
Autor: Akira Kawai, Norio Moriike
Publikováno v: Journal of Photopolymer Science and Technology. 14:507-512
By directly applying load to a top corner of dot resist pattern with a microcantilever tip, a dot pattern adhering on a substrate can be deformed and collapsed easily. The elastic and adhesion properties of a dot resist pattern can be analyzed quanti
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::ce25dd1508add86e7bc62d1e6af30e32
https://doi.org/10.2494/photopolymer.14.507
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