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pro vyhledávání: '"Norihiro Tarumoto"'
Autor:
Minoru Naitoh, Sachiko Ishikita, Hiroyuki Miyashita, Toshiharu Nishimura, Naoya Hayashi, Masaaki Kurihara, M. Katoh, Kazuo Suwa, Norihiro Tarumoto, Tatsuya Tomita, Hiroyuki Nakamura, D. Tagaya
Publikováno v:
Photomask and X-Ray Mask Technology.
A half-tone phase shift mask process has been developed. The writing and process for normal masks are found to be applicable to HT-PSMs. A dry etch process has been adopted to etch the shifter. Several characteristics of HT-PSMs such as CD uniformity
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0324613713143c928b1a6ca0de7d0fd6
https://doi.org/10.1117/12.191937
https://doi.org/10.1117/12.191937
