Zobrazeno 1 - 10
of 20
pro vyhledávání: '"Noriaki Shimodaira"'
Publikováno v:
Journal of Non-Crystalline Solids. 353:568-572
The refractive index and density of halogen-doped silica glasses were measured as a function of fictive temperature, and the relationship between the refractive index and density was discussed on the basis of the Lorentz–Lorenz formula. The effect
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fecfdce4ba120209d7c8c59fbf4faf90
https://doi.org/10.1016/j.jnoncrysol.2006.10.025
https://doi.org/10.1016/j.jnoncrysol.2006.10.025
Publikováno v:
Advances in Glass and Optical Materials, Volume 173
Structural changes including relaxation process of 5 mol% fluorine doped silica glass with low initial fictive temperature (T f ) of 700°C has been studied by in-situ Raman spectroscopy at temperatures 27 - 1300°C. With increasing temperature, ω 1
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1fd05d028ea764a82a4a125fafa7b64f
https://doi.org/10.1002/9781118407974.ch9
https://doi.org/10.1002/9781118407974.ch9
Publikováno v:
Physical Review B. 73
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::764a12f82529aface8acd154094d5633
https://doi.org/10.1103/physrevb.73.214206
https://doi.org/10.1103/physrevb.73.214206
Publikováno v:
SPIE Proceedings.
The technological development of projection photolithography at the 157 nm wavelength of the F2 laser followed by the 193 nm of the ArF excimer laser has been progressing rapidly. Fused silica glass is most promising candidate for 157 nm photomasks,
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b6b7a956d0e0239a7f2292efac55d5a3
https://doi.org/10.1117/12.388996
https://doi.org/10.1117/12.388996
Autor:
Shinya Kikugawa, Kawahara Takayuki, Shuhei Yoshizawa, Yoshiaki Ikuta, Hitoshi Mishiro, Noriaki Shimodaira
Publikováno v:
SPIE Proceedings.
Projection photolithography at 157 nm is now under research as a possible extension of current 248 nm and planned 193 nm technologies. We have succeeded in the development of the modified fused silica glass 'AQF' for 157 nm lithography. In this paper
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7e929df3c3d55aa2bd6a69ccfff0446a
https://doi.org/10.1117/12.388990
https://doi.org/10.1117/12.388990
Autor:
Kawahara Takayuki, Noriaki Shimodaira, Hiroshi Arishima, Shuhei Yoshizawa, Hitoshi Mishiro, Yoshiaki Ikuta, Shinya Kikugawa
Publikováno v:
SPIE Proceedings.
Projection photolithography at 157 nm is now under research as a possible extension of current 248 nm and planned 193 nm technologies. However, the conventional silica glass used for 248 nm and 193 nm lithography cannot be applied for 157 nm lithogra
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0503d0819abb60b125b3ee9d2e685e53
https://doi.org/10.1117/12.373303
https://doi.org/10.1117/12.373303
Autor:
Yoshiaki Ikuta, Shinya Kikugawa, Akio Masui, Noriaki Shimodaira, Shuhei Yoshizawa, Masahiro Hirano
Publikováno v:
SPIE Proceedings.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7c7d800c850baf8bec02f704505fed49
https://doi.org/10.1117/12.351160
https://doi.org/10.1117/12.351160
Publikováno v:
Applied Physics Letters. 86:161907
The refractive index and density of fluorine- and chlorine-doped silica glasses were measured as functions of fictive temperature. The halogen concentrations were observed to have a refractive index or density that is independent of the fictive tempe
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::82b3bdc5d938480908abeead7ba3944e
https://doi.org/10.1063/1.1897062
https://doi.org/10.1063/1.1897062
Autor:
Noriaki Shimodaira, Motohiro Kanno
Publikováno v:
Journal of the Japan Institute of Metals. 51:530-535
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2ad2c32f90c2e3f41149fd9947195d0e
https://doi.org/10.2320/jinstmet1952.51.6_530
https://doi.org/10.2320/jinstmet1952.51.6_530
Autor:
Noriaki Shimodaira, Motohiro Kanno
Publikováno v:
Scripta Metallurgica. 21:1487-1492
The addition of a small amount of yttrium was found to improve ductility at intermediate temperatures or alleviate considerably what is called intermediate temperature embrittlement. The embrittlement in this case was considered to be related to the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0ac77e7a41177c3d9737033301f12b63
https://doi.org/10.1016/0036-9748(87)90288-2
https://doi.org/10.1016/0036-9748(87)90288-2