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pro vyhledávání: '"Noriaki Majima"'
Autor:
Yoshiomi Hiroi, Haruyuki Okamura, Noriaki Majima, Masamitsu Shirai, Shigeo Kimura, Yasuyuki Nakajima
Publikováno v:
Advances in Resist Materials and Processing Technology XXVI.
In chemically amplified (CA) resist process, photo-chemically generated acid is needed to diffuse in resist matrix to induce the de-blocking reaction. The concentration of acid in resist matrix should be constant during the post-exposure-bake (PEB) t
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::34da76abbb5b77a873fd1cc44bf96105
https://doi.org/10.1117/12.813379
https://doi.org/10.1117/12.813379
