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pro vyhledávání: '"Nonmembers Shuichi Hanashima"'
Autor:
Nonmember Toshiharu Matsuzawa, Member Tetsuo Itoh, Nonmembers Shuichi Hanashima, Kazuya Kadota
Publikováno v:
Electronics and Communications in Japan (Part II: Electronics). 71:41-49
A three-dimensional photoresist shape simulator has been developed for the submicron process. Using this simulator, it is possible to analyze and optimize the photoresist process using an arbitrary projector, photoresist, and developer. In this techn
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e0d06f27d374bb36b0394862964c6b93
https://doi.org/10.1002/ecjb.4420710105
https://doi.org/10.1002/ecjb.4420710105
