Zobrazeno 1 - 10
of 10
pro vyhledávání: '"Noelle Wright"'
Autor:
Remco Dirks, Ethan Chiu, Henk Niesing, Baukje Wisse, Stefan Geerte Kruijswijk, Reinder Teun Plug, Bijoy Rajasekharan, Mariya Ponomarenko, Sylvia Yuan, Marlene Strobl, Platt Hung, Noelle Wright, Wilhelm Tsai, Vincent Couraudon, David Huang, Thomas M. Chen, Henry Chen, Paul K. L. Yu, Yi Song, Frida Liang, Andy Lan, Alan Wang, Wilson Hsu, Hugo Augustinus Joseph Cramer
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXVIII.
Integrated metrology in the lithography cluster is a promising solution to tighten process control. It is shown that optical CD metrology using YieldStar, an angular resolved scatterometer, meets all requirements in terms of precision, process robust
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8494e48a6e6ed8de43718353dbe049e0
https://doi.org/10.1117/12.2047205
https://doi.org/10.1117/12.2047205
Autor:
Chan-Ho Ryu, Hans Van Der Laan, Peter Ten Berge, Noelle Wright, Chang Moon Lim, Maryana Escalante Marun, Myoung-Soo Kim, Hugo Augustinus Joseph Cramer, Jongsu Lee, Birgitt Hepp, Hyosang Kang, Liesbeth Reijnen
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXVI.
Improving Critical Dimension Uniformity (CDU) for spacer double patterning features is a high priority for double patterning technology. In spacer double patterning the gaps between the spacers are established through various processes (litho, etch,
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1ef1f7c5bd4e09f02957fafdd3715d77
https://doi.org/10.1117/12.917824
https://doi.org/10.1117/12.917824
Autor:
Arie Jeffrey Den Boef, Paul Christiaan Hinnen, Henry Megens, Kaustuve Bhatacharrya, Noelle Wright, Michael Kubis, Hugo Augustinus Joseph Cramer, Maurits van der Schaar
Publikováno v:
Imaging and Applied Optics.
A model-based optical metrology concept is presented that can be used for measuring the shape and position of resist features in the production of Memory and Logic devices. A few application examples are presented that demonstrate the capabilities of
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::068b5d81ebf78405e69507d67a5eb681
https://doi.org/10.1364/cosi.2011.cwa1
https://doi.org/10.1364/cosi.2011.cwa1
Autor:
Omer Adam, R. Goossens, Wen-Chuan Wang, Andreas Fuchs, Mir Shahrjerdy, Karel van der Mast, Sophia Wang, Vivien Wang, Y. Cao, T. S. Gao, Jon Wu, Tsung-Chih Chien, X. Xie, W. T. Yang, Sophie Peng, R. C. Peng, H. H. Liu, Noelle Wright, Kaustuve Bhattacharyya, Szu-Yuan Lin, W. Lin, Jacky Huang, Simon Hsieh, Chih-Ming Ke, K. Lin, Maurits van der Schaar, Victor Shih, W. Shao, Chau Hui Wang, Yi-Yin Chen, John Lin, H. J. Lee, Miranda Un
Publikováno v:
2010 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
In this work, we propose a new technique for comprehensive scanner matching to fundamentally improve scanner productivity in a Giga fab. The proposal covers matching solutions for both CD and overlay fingerprints among scanners. CD matching strategy
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e48363d1cd2a02602e04f67f2ae864ac
https://doi.org/10.1109/asmc.2010.5551449
https://doi.org/10.1109/asmc.2010.5551449
Autor:
Guo-Tsai Huang, Noelle Wright, Spencer Lin, L. G. Terng, Wei-Shun Tzeng, Jon Wu, Li-Jui Chen, Mir Shahrjerdy, C. R. Liang, Sophie Peng, Cathy Wang, Gavin Liu, Omer Adam, Willie Wang, Chih-Ming Ke, T. S. Gau, Vivien Wang, Victor Shih, W. T. Yang, Jacky Huang, Sophia Wang, Kaustuve Bhattacharyya, Maurits van der Schaar, Andreas Fuchs, John Lin, H. J. Lee, Heng-Hsin Liu, Marc Noot, Jim Chen
Publikováno v:
SPIE Proceedings.
Advanced lithography is becoming increasingly demanding when speed and sophistication in communication between litho and metrology (feedback control) are most crucial. Overall requirements are so extreme that all measures must be taken in order to me
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::705163b9d6ce68c2eeef8c70cc58b6a9
https://doi.org/10.1117/12.853318
https://doi.org/10.1117/12.853318
Autor:
Sophia Wang, Alan Ho, Guo-Tsai Huang, Cathy Wang, Jon Wu, Vivien Wang, L. G. Terng, Willie Wang, Victor Shih, Noelle Wright, Spencer Lin, W. T. Yang, Mir Shahrjerdy, John Lin, Jacky Huang, Karel van der Mast, Omer Adam, Chih-Ming Ke, H. J. Lee, Dennis Chang, H. H. Liu, C. R. Liang, H. L. Chung, T. S. Gau, Maurits van der Schaar, Li-Jui Chen, Sophie Peng, Kaustuve Bhattacharyya, Andreas Fuchs
Publikováno v:
SPIE Proceedings.
ASML Advanced lithography is becoming increasingly demanding when speed and sophistication in communication between litho and metrology (feedback control) are most crucial. Overall requirements are so extreme that all measures must be taken in order
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bf9354fdc632039118e4ca608acb0571
https://doi.org/10.1117/12.837353
https://doi.org/10.1117/12.837353
Autor:
Vivien Wang, C. R. Liang, Willie Wang, Jimmy Hu, H. L. Chung, Andreas Fuchs, Noelle Wright, Hsin-Chang Lee, Kaustuve Bhattacharyya, Y. D. Fan, Spencer Lin, Maurits van der Schaar, Jacky Huang, Chih-Ming Ke, Victor Shih, Kiwi Yuan, H. H. Liu, John Lin, Cathy Wang, Mir Shahrjerdy, Karel van der Mast
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXIII.
A new metrology technique is being evaluated to address the need for accuracy, precision, speed and sophistication in metrology in near-future lithography. Attention must be paid to these stringent requirements as the current metrology capabilities m
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6d1587a8a4c9f5f6a73e48943119e1c7
https://doi.org/10.1117/12.814860
https://doi.org/10.1117/12.814860
Autor:
Jimmy Hu, Wim M. J. Coene, Karel van der Mast, Victor Shih, Vivien Wang, Hsin-Chang Lee, Tony Yen, Chih-Ming Ke, Kaustuve Bhattacharyya, H. H. Liu, John Lin, Jacky Huang, Marc Noot, Kiwi Yuan, Noelle Wright, Y. D. Fan, Willie Wang, Ruben Alvarez Sanchez, C. R. Liang, H. L. Chung
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXIII.
A brand new CD metrology technique that can address the need for accuracy, precision and speed in near future lithography is probably one of the most challenging items. CDSEMs have served this need for a long time, however, a change of or an addition
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b77540de9dc04f5394a8fcadaf0acda2
https://doi.org/10.1117/12.814909
https://doi.org/10.1117/12.814909
Autor:
Noelle Wright, Kaustuve Bhattacharyya, Spencer Lin, Willie Wang, Chih-Ming Ke, Arie Jeffrey Den Boef, Paul Christiaan Hinnen, Cathy Wang, Maurits van der Schaar, Mir Shahrjerdy, Vivien Wang, Jacky Huang
Publikováno v:
Journal of Micro/Nanolithography, MEMS, and MOEMS. 10:013013
mmunication between lithography and metrology is becoming increasingly demanding in advanced nodes. This is where the requirements for metrology become extremely tight. This work is dedicated to the search for "clean" metrology that is required to ad
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7e6292809ba49f293d84427a2a76178c
https://doi.org/10.1117/1.3532076
https://doi.org/10.1117/1.3532076
Autor:
Kaustuve Bhattacharyya, Noelle Wright, Maurits van der Schaar, Arie den Boef, Paul Hinnen, Mir Shahrjerdy, Vivien Wang, Spencer Lin, Cathy Wang, Chih-Ming Ke, Jacky Huang, Willie Wang
Publikováno v:
Journal of Micro/Nanolithography, MEMS & MOEMS; Jan-Mar2011, Vol. 10 Issue 1, p013013-013013-8, 1p