Zobrazeno 1 - 10
of 129
pro vyhledávání: '"Nobuyoshi Kobayashi"'
Autor:
Takayuki Horii, Yuki Orikawa, Yuta Ohira, Runa Eta, Nobuyoshi Kobayashi, Takanori Sato, Takeshi Watanabe, Takao Tanaka
Publikováno v:
Cancer Cell International, Vol 22, Iss 1, Pp 1-11 (2022)
Abstract The tumor microenvironment is one of the most important factors determining the efficacy of cancer immunotherapy. In particular, variability in efficacy has been linked to whether tumors are hot or cold, with hot tumors exhibiting greater T
Externí odkaz:
https://doaj.org/article/32e060b38010476894e83daa483fe01b
Autor:
Nobuyoshi Kobayashi, Tsuyoshi Nishi, Takahiro Hirata, Akio Kihara, Takamitsu Sano, Yasuyuki Igarashi, Akihito Yamaguchi
Publikováno v:
Journal of Lipid Research, Vol 47, Iss 3, Pp 614-621 (2006)
Sphingosine 1-phosphate (S1P) is accumulated in platelets and released on stimulation by thrombin or Ca2+. Thrombin-stimulated S1P release was inhibited by staurosporin, whereas Ca2+-stimulated release was not. When the platelet plasma membrane was p
Externí odkaz:
https://doaj.org/article/b023379be8484c3c9a7ed59f617311ce
Autor:
Satoshi Shimomura, Shiori Horibuchi-Matsusaki, Sakae Tanosaki, Satoshi Umemura, Tetsuo Yamamoto, Nobuyoshi Kobayashi, Makoto Akashi, Takashi Ikeda, Misao Hachiya, Takako Tominaga, Taiji Tamura
Publikováno v:
Toxicology Letters. 350:283-291
Diethylenetriaminepentaacetate (DTPA) is the most widely used chelating agent for Pu and Am. Volunteers were assigned to receive intravenous injections or aerosol inhalations of 1 g of DTPA on days 1-4; volunteers received once daily injections of Ca
Autor:
Airah P. Osonio, Takayoshi Tsutsumi, Yoshinari Oda, Bablu Mukherjee, Ranjit Borude, Nobuyoshi Kobayashi, Masaru Hori
Publikováno v:
Journal of Vacuum Science & Technology A. 40:062601
A novel route to achieve an ideal plasma-enhanced atomic layer etching of silicon dioxide with self-limiting deposition and area-selective feature over silicon nitride is demonstrated in this work using a silane coupling agent and argon plasma. While
Autor:
Kazuya Nakane, Takayoshi Tsutsumi, B. Mukherjee, René H. J. Vervuurt, Nobuyoshi Kobayashi, Masaru Hori
Publikováno v:
Langmuir : the ACS journal of surfaces and colloids. 37(43)
In this work, atomic layer etching (ALE) of Si compounds using H2 or N2 plasma modification followed by fluorine radical exposure is discussed. It is shown that the H2 plasma modification process promotes the selective etching of SiN, SiC, and SiCO v
Publikováno v:
ACS Applied Materials & Interfaces. 11:37263-37269
The atomic layer etching (ALE) of silicon nitride (SiN) via a hydrogen plasma followed by exposure to fluorine radicals was investigated by using in situ spectroscopic ellipsometry and attenuated t...
Publikováno v:
ECS Transactions. 77:25-28
Plasma processes for atomic scale deposition and etching are required for nanoscale devices such as Fin-field effect transistors (FETs), nanowires, 3D NAND-type flash memory units, and others 3D devices. To achieve high performance of such nanoscale
Autor:
Runa Eta, Takayuki Horii, Yuta Ohira, Yuki Orikawa, Nobuyoshi Kobayashi, Yuko Hori, Masahiro Okamoto, Takao Tanaka, Koji Yoshinaga, Kokichi Katsunuma, Mineo Takei, Koichi Seto
Publikováno v:
Biological and Pharmaceutical Bulletin. 37:642-647
Lymphatic metastasis is common in advanced-stage carcinoma and is associated with a poor prognosis. However, few effective treatments to inhibit it are available. Z-100 is an immunomodulatory extract of Mycobacterium tuberculosis strain Aoyama B that
Autor:
Takamichi Shigaki, Hiroyuki Arai, Yuko Nakahara, Kazuichi Nakamura, Takafumi Yamaguchi, Yasuhiro Itano, Nobutaka Morimoto, Shunsuke Tawara, Shinsuke Itoh, Shigeru Masumi, Jiro Seki, Nobuyoshi Kobayashi, Kazuo Niwa
Publikováno v:
Folia Pharmacologica Japonica. 144:126-132
Autor:
Takafumi Yamaguchi, Kazuichi Nakamura, Shinsuke Itoh, Yuko Nakahara, Jiro Seki, Nobuyoshi Kobayashi, Kazuo Niwa, Nobutaka Morimoto, Hiroyuki Arai, Shunsuke Tawara, Yasuhiro Itano, Shigeru Masumi
Publikováno v:
Folia Pharmacologica Japonica. 143:198-202