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pro vyhledávání: '"Nobumichi Kanayamaya"'
Autor:
Tomoyuki Matsuyama, Ryota Matsui, Nobumichi Kanayamaya, Naonori Kita, Shane R. Palmer, Donis G. Flagello, Daniel Smith
Publikováno v:
SPIE Proceedings.
Source Mask Optimization (SMO) is one of the most important techniques available for extending ArF immersion lithography1. However, imaging with a small k12 factor (~0.3 or smaller) is very sensitive to errors in the illumination pupil2. As a result,
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::55b06a070bd5866952f8a0cd8448fc6b
https://doi.org/10.1117/12.879116
https://doi.org/10.1117/12.879116
