Zobrazeno 1 - 10
of 23
pro vyhledávání: '"Nobuji Sakai"'
Autor:
Atsushi Sekiguchi, Takeshi Ohsaki, Nobuji Sakai, Hiroyuki Kawata, Yoshihiko Hirai, Ryusuke Suzuki
Publikováno v:
Journal of Photopolymer Science and Technology. 25:211-216
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8296a79896813f8faf3b1970cc18d0c0
https://doi.org/10.2494/photopolymer.25.211
https://doi.org/10.2494/photopolymer.25.211
Publikováno v:
Microelectronic Engineering. 87:859-863
Ultraviolet nanoimprint lithography (UV-NIL) is a powerful tool for nanoscale fabrication. However, the replication of high-density, high-aspect-ratio mold patterns by UV-NIL is very difficult because of the strong forces required to release the repl
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5ff810cf5b332e7c35cc70a16453cd58
https://doi.org/10.1016/j.mee.2009.12.051
https://doi.org/10.1016/j.mee.2009.12.051
Autor:
Kazutomo Osari, Nobuji Sakai, Noriyuki Unno, Takeshi Ohsaki, Ken-ichi Machinaga, Jun Taniguchi
Publikováno v:
Microelectronic Engineering. 87:918-921
Ultra violet nanoimprint lithography (UV-NIL), which is able to obtain the nano-scale pattern effectively and quickly, is strongly desired for the next-generation lithography technology. However, it is well known that the higher viscosity UV-curable
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::284346c329fe54dd5ee476d5c3e1e088
https://doi.org/10.1016/j.mee.2009.11.175
https://doi.org/10.1016/j.mee.2009.11.175
Autor:
Nobuji Sakai, Atsushi Sekiguchi, Ryosuke Suzuki, Risa Tanaka, Yoshihiko Hirai, Yoko Matsumoto
Publikováno v:
Journal of Photopolymer Science and Technology. 23:51-54
Mechanical characteristics of UV curable resist for UV nanoimprint lithography are investigated using UV rheology meter. Modulations of visco-elatic properties and thickness shrinkages in typical resists are evaluated in variation of exposure UV inte
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::22f957e9975264ee57dcd7bfbcfee6ee
https://doi.org/10.2494/photopolymer.23.51
https://doi.org/10.2494/photopolymer.23.51
Publikováno v:
Electronics and Communications in Japan. 92:51-56
Five kinds of photo-curable resins were prepared, and their thermal properties, mechanical properties, and suitability for the imprint process were experimentally evaluated. Measurements of thermal properties using the TG method, TM-DSC method, and l
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::43128e93c5e1d4978aafc76f90094d12
https://doi.org/10.1002/ecj.10136
https://doi.org/10.1002/ecj.10136
Publikováno v:
Microelectronic Engineering. 86:676-680
The filling behavior of resin during UV nanoimprint lithography (UV-NIL) was observed by using a ''midair structure mold'' and by changing the imprint pressure. The midair structure molds were fabricated by electron beam lithography (EBL) using hydro
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::41319713a6b66981a92294b82ada825c
https://doi.org/10.1016/j.mee.2008.12.085
https://doi.org/10.1016/j.mee.2008.12.085
Publikováno v:
Journal of Photopolymer Science and Technology. 22:175-180
Two photo-curable resins (PAK-01 and PAK-02) have been evaluated by a primitive test and a precise test. The primitive test is simple manual transfer process and the precise test is using UV nanoimprint lithography (UV-NIL) machine. At first, nano or
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0f815b538e068fd9dbd413eacf32ec70
https://doi.org/10.2494/photopolymer.22.175
https://doi.org/10.2494/photopolymer.22.175
Autor:
Tamano Hirasawa, Nobuji Sakai, Hiroaki Kawata, Toshiaki Tanabe, Yoshihiko Hirai, Noriyoshi Fujii
Publikováno v:
Journal of Photopolymer Science and Technology. 22:181-184
Mold releasing forces are experimentally measured in various exposure dosages for UV nanoimprint resist. PAK01 resist is examined to evaluate the chemical conversion by FTIR. Time dependent conversion ratio is measured under UV exposure and the conve
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9ae956b9f7dde9a250a9c5e4b3133f40
https://doi.org/10.2494/photopolymer.22.181
https://doi.org/10.2494/photopolymer.22.181
Autor:
Nobuji Sakai, Jun Mizuno, Tamano Hirasawa, Tomotaka Shibazaki, Jun Taniguchi, Hidetoshi Shinohara, Shunichi Shoji
Publikováno v:
Journal of Photopolymer Science and Technology. 22:727-730
Desktop type equipment of thermal-assisted UV roller imprinting was developed. A remarkable advantage of the desktop type equipment is expected to be easy evaluation of replication results using different molds with small amounts of resin. Replicatio
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6ceb451d3f4b991c1c57577ea7b6d761
https://doi.org/10.2494/photopolymer.22.727
https://doi.org/10.2494/photopolymer.22.727
Autor:
Ken ichi Machinaga, Kazutomo Osari, Nobuji Sakai, Noriyuki Unno, Takeshi Ohsaki, Jun Taniguchi
Publikováno v:
Journal of Photopolymer Science and Technology. 22:161-166
Next-generation fine patterning requires a high throughput cost-effective process for the mass producing of various devices, which has a nanometer-scale pattern over a large area. UV nanoimprint lithography (UV-NIL) is a major breakthrough in this fi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::96ef50aa9deddd469cdb9d961e112aa0
https://doi.org/10.2494/photopolymer.22.161
https://doi.org/10.2494/photopolymer.22.161