Zobrazeno 1 - 10
of 123
pro vyhledávání: '"Nobufumi ATODA"'
Autor:
Christophe Mihalcea, Nobufumi Atoda, Hiroshi Fuji, Junji Tominaga, Takashi Kikukawa, Masashi Kuwahara
Publikováno v:
Microelectronic Engineering. :415-421
We have succeeded in patterning narrow lines and dots with 100 nm dimensions in a photoresist film by a ‘thermal lithography’ technique using a semiconductor laser with 635 nm wavelength. The demonstrated resolution of the patterns produced is fa
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ea0d97e24f044c73aef9bbec0a2efff9
https://doi.org/10.1016/s0167-9317(02)00435-5
https://doi.org/10.1016/s0167-9317(02)00435-5
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 20:437-440
Magnetic and optical properties of magneto-optical TbFeCo thin films were investigated by a helicon-wave sputtering with a 200 mm distance between a substrate and target. According to deposition conditions such as power and pressure, the coercivity (
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::76ddd654cceff809dd008aac47f87c42
https://doi.org/10.1116/1.1448508
https://doi.org/10.1116/1.1448508
Publikováno v:
Microelectronic Engineering. :781-786
We report on an improved standard etching method to fabricate deep etched 〈100〉-oriented Silicon surfaces with a mirrorlike finish. It is shown that the addition of minimal quantities of an antimony or arsenic compound (in the mmol range) to a 40
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a3c932fdf9f73aede93333b939a58672
https://doi.org/10.1016/s0167-9317(01)00488-9
https://doi.org/10.1016/s0167-9317(01)00488-9
Autor:
Jae-Kwan Kim, Nobufumi Atoda, T. Shima, C. Mihalcea, Junji Tominaga, Masashi Kuwahara, Takashi Nakano
Publikováno v:
Microelectronic Engineering. :883-890
We have achieved less than 0.1 μm linewidth fabrication in a photoresist film by using visible light together with a super-resolution near-field structure (Super-RENS). This technique enables to produce an optical aperture with sub-wavelength dimens
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1ae5a5ab5a6a56a076f9b86f54e3156c
https://doi.org/10.1016/s0167-9317(01)00450-6
https://doi.org/10.1016/s0167-9317(01)00450-6
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 19:826-829
Antimony (Sb) films were prepared by heliconwave-plasma sputtering method. Refractive indices change of Sb films was examined as functions of the film thickness (3.5–100 nm) and sputtering pressure (0.2–0.8 Pa). As the thickness increased from 5
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::03f1d1b30328c5e22b4fbbedfe0a93f5
https://doi.org/10.1116/1.1368841
https://doi.org/10.1116/1.1368841
Autor:
Takayuki Shima, Joo Ho Kim, Takashi Nakano, Dorothea Buechel, Hiroyuki Katayama, Hiroshi Fuji, Nobufumi Atoda, Junji Tominaga
Publikováno v:
Journal of the Magnetics Society of Japan. 25:383-386
Super-resolution readout was established by using a non-magnetic readout layer on a magneto-optical disk. The readout layer was composed of AgOx and separated from a recording layer at a near-field coupling distance as well as a super-resolution near
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5faf828a3631f63ac8a537c587b13424
https://doi.org/10.3379/jmsjmag.25.383
https://doi.org/10.3379/jmsjmag.25.383
Publikováno v:
Journal of the Magnetics Society of Japan. 25:240-243
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::57304851383c48f38333ad44f687039a
https://doi.org/10.3379/jmsjmag.25.240
https://doi.org/10.3379/jmsjmag.25.240
Improvement of Super-RENS MO Disk Characteristics by Optimized Super-Resolution Near-Field Structure
Autor:
Takayuki Shima, Junji Tominaga, Nobufumi Atoda, Takashi Nakano, Dorothea Buechel, Hiroshi Fuji, Jooho Kim
Publikováno v:
Journal of the Magnetics Society of Japan. 25:387-390
As a result of applying super-resolution near-field structure to a magneto-optical disk with a non-magnetic mask layer such as a silver oxide light scattering center type mask layer, we could retrieve the signals of below 200-nm mark length. With the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3dd6ff4d9684b62f368ad82d2bbf5414
https://doi.org/10.3379/jmsjmag.25.387
https://doi.org/10.3379/jmsjmag.25.387
Publikováno v:
Microelectronic Engineering. 53:535-538
We have succeeded in fabricating narrow grooves in a photoresist film by a new lithography technique using an optical near-field with 365nm and 440nm light sources. This technique makes use of super-resolution near-field structure (Super-RENS) which
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0009abea49040cf597d2ac04e9e10430
https://doi.org/10.1016/s0167-9317(00)00372-5
https://doi.org/10.1016/s0167-9317(00)00372-5
Publikováno v:
Microelectronic Engineering. 30:199-202
Deflection of the X-ray mask membrane caused by stepper motion, i.e., changing the mask-to-wafer gap and stepping the wafer parallel to the mask, was evaluated. The effects of film tension, mask configuration and velocity of wafer stage movement on t
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c771fceec4ba30d0fc67b0d876e1fb19
https://doi.org/10.1016/0167-9317(95)00226-x
https://doi.org/10.1016/0167-9317(95)00226-x