Zobrazeno 1 - 10
of 15
pro vyhledávání: '"Nitisak Pasaja"'
Publikováno v:
Current Applied Science and Technology. 23
An anode layer ion source, or an ALIS, is classified as a gridless ion source that produces a high-energy ion beam for either surface etching or thin film deposition. In the present work, the energy distribution functions of the ions generated in a c
Autor:
Anthika Lakhonchai, Artit Chingsungnoen, Phitsanu Poolcharuansin, Nitisak Pasaja, Phuwanai Bunnak, Mongkhol Suwanno
Publikováno v:
Thin Solid Films. 747:139140
Publikováno v:
Plasma
Volume 1
Issue 2
Pages 24-284
Volume 1
Issue 2
Pages 24-284
An ionized physical vapor deposition technique for thin ferromagnetic films is proposed. The technique is based on high power impulse magnetron sputtering (HiPIMS) with positive discharge polarity. A gapped-target was employed as the cathode of the m
Autor:
T. Saisopa, Jidapa Lomon, Narong Chanlek, Artit Chingsungnoen, Ratchadaporn Supruangnet, Prayoon Songsiriritthigul, Hideki Nakajima, Phitsanu Poolcharuansin, Nitisak Pasaja
Publikováno v:
Radiation Physics and Chemistry. 171:108752
The effect of adventitious contamination on total-electron-yield XANES analysis of carbon species of diamond-like carbon (DLC) films was investigated. XPS and XANES measurements on a DLC sample with different amounts of contamination were carried out
Autor:
James W. Bradley, Mati Horprathum, Nitisak Pasaja, Paveena Laokul, Artit Chingsungnoen, Pongpan Chindaudom, Phitsanu Poolcharuansin
Publikováno v:
VACUUM
An inverted gapped-target magnetron sputtering device has been developed for deposition of ferromagnetic thin films under energetic conditions. The main feature of this technique is that the discharge is driven by a positive voltage relative to a gro
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::8755a1bc738586c44278e8a875071aad
Autor:
Sarayut Tunmee, Artit Chingsungnoen, Nitisak Pasaja, Anthika Lakhonchai, Mati Horprathum, Hiroki Akasaka, Ukit Rittihong, Phitsanu Poolcharuansin, Chanan Euaraksakul, Narong Chanlek
Publikováno v:
Materials Research Express. 6:126410
Autor:
N. Chanlek, Phitsanu Poolcharuansin, Jidapa Lomon, T. Saisopa, Nopphon Saowiang, Hideki Nakajima, P. Chaiyabin, Ratchadaporn Supruangnet, Prayoon Songsiriritthigul, K Promsakha, Nitisak Pasaja, Artit Chingsungnoen, K. Seawsakul
Publikováno v:
Journal of Physics: Conference Series. 1144:012048
Publikováno v:
Surface and Coatings Technology. 229:36-41
A cathodic vacuum arc plasma (CVAP) system was constructed at Chiang Mai University to be used for the deposition of nanostructured and nanocomposite thin films. Various CVAP sources were developed, such as with a single or dual-rod cathode. A range
Publikováno v:
Pasaja, Nitisak; Sansongsiri, Sakon; Anders, Andre; Vilaithong, Thiraphat; & Intasiri, Sawate. (2006). Mo-containing tetrahedral amorphous carbon deposited by dual filtered cathodic vacuum arc with selective pulsed bias voltage. Lawrence Berkeley National Laboratory. Lawrence Berkeley National Laboratory: Lawrence Berkeley National Laboratory. Retrieved from: http://www.escholarship.org/uc/item/09x7w4td
Pasaja, Nitisak; Sansongsiri, Sakon; Intasiri, Sawate; Vilaithong, Thiraphat; & Anders, Andre. (2007). Mo-containing tetrahedral amorphous carbon deposited by dual filtered cathodic vacuum arc with selective pulsed bias voltage. Lawrence Berkeley National Laboratory. Lawrence Berkeley National Laboratory: Lawrence Berkeley National Laboratory. Retrieved from: http://www.escholarship.org/uc/item/764016vk
Pasaja, Nitisak; Sansongsiri, Sakon; Intasiri, Sawate; Vilaithong, Thiraphat; & Anders, Andre. (2007). Mo-containing tetrahedral amorphous carbon deposited by dual filtered cathodic vacuum arc with selective pulsed bias voltage. Lawrence Berkeley National Laboratory. Lawrence Berkeley National Laboratory: Lawrence Berkeley National Laboratory. Retrieved from: http://www.escholarship.org/uc/item/764016vk
Metal-containing tetrahedral amorphous carbon films were produced by dual filtered cathodic vacuum arc plasma sources operated in sequentially pulsed mode. Negatively pulsed bias was applied to the substrate when carbon plasma was generated, whereas
Publikováno v:
Surface and Coatings Technology. 201:4628-4632
It is well known that the structure and properties of diamond-like carbon, and in particular the sp3/sp2 ratio, can be controlled by the energy of the condensing carbon ions or atoms. In many practical cases, the energy of ions arriving at the surfac