Zobrazeno 1 - 10
of 34
pro vyhledávání: '"Nishimura, Suzuka"'
Publikováno v:
In Materials Science & Engineering B 2002 93(1):135-138
Autor:
Terashima, Kazutaka *, Nishimura, Suzuka
Publikováno v:
In Materials Science & Engineering B 2002 91:178-181
Publikováno v:
In Journal of Crystal Growth 2002 237 Part 3:1797-1801
Publikováno v:
In Journal of Crystal Growth 2002 237 Part 3:1667-1670
Publikováno v:
In Journal of Crystal Growth 2002 240(3):445-453
Autor:
Nishimura, Suzuka *, Terashima, Kazutaka
Publikováno v:
In Materials Science & Engineering B 2000 75(2):207-209
Autor:
Nishimura, Suzuka *, Terashima, Kazutaka
Publikováno v:
In Applied Surface Science 2000 159:288-291
Publikováno v:
Journal of Applied Physics; Sep2008, Vol. 104 Issue 5, p053103, 4p, 4 Graphs
Publikováno v:
宇宙開発事業団技術報告 = NASDA Technical Memorandum. :125-129
窒化ほう素基板へのシリコン融液の湿潤性を温度および保持時間の関数として検討した。接触角は接触開始から減少し、150分後にはほぼ定値に達することが分かった。2次イオン質量分析
Publikováno v:
宇宙開発事業団技術報告: Modeling and Precise Experiments of Diffusion Phenomena in Melts Under Microgravity: Annual Reports 2001 = NASDA Technical Memorandum: Modeling and Precise Experiments of Diffusion Phenomena in Melts Under Microgravity: Annual Reports 2001. :143-145
The oxygen diffusion has been studied by using the capillary technique. As the initial stage of quartz dissolution into silicon melts causes an experimental error, the holding time of more than 30 min was needed to analyze the diffusion constant. The