Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Nina Vladimirovna Dziomkina"'
Autor:
Silvester Houweling, John Zimmerman, Laurens de Winters, Brian Blum, Juan Diego Arias Espinoza, Kamali Mohammad Reza, Yang Liu, Hans Meiling, Marco Reijnen, Joost de Hoogh, Nina Vladimirovna Dziomkina, Kursat Bal, Luigi Scaccabarozzi, Ijen van Mil, Carmen Zoldesi, Ronald Frank Kox, Henk Meijer, Beatrijs Louise Marie-Joseph Katrien Verbrugge, Azeredo Lima Jorge Manuel, Derk Brouns, Robert de Kruif, Alain Kempa, Xiong Xugang, Guus Bock, Daniel Smith, Florian Didier Albin Dhalluin, Maarten Mathijs Marinus Jansen
Publikováno v:
Wood, O.R.Panning, E.M., Extreme Ultraviolet (EUV) Lithography V, 90481N-1-90481N-10
As EUV approaches high volume manufacturing, reticle defectivity becomes an even more relevant topic for further investigation. Current baseline strategy for EUV defectivity management is to design, build and maintain a clean system without pellicle.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::834bd6f420e0f7cc25eefca0c14b11bb
http://resolver.tudelft.nl/uuid:dd53d834-e078-4f7b-85cc-1d9ff6193e19
http://resolver.tudelft.nl/uuid:dd53d834-e078-4f7b-85cc-1d9ff6193e19
Autor:
Henk Meijer, Pedro Julian Rizo Diago, Daniel Smith, Eric Casimiri, Luigi Scaccabarozzi, Nina Vladimirovna Dziomkina
Publikováno v:
Extreme Ultraviolet (EUV) Lithography IV.
EUV defectivity has been an important topic of investigation in past years. Today, the absence of a pellicle raises concerns for particle adders on reticle front side. A desire to improve defectivity on reticle front side via implementation of a pell
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a5ba8a5b33365a283be3ab7cfd01e045
https://doi.org/10.1117/12.2015833
https://doi.org/10.1117/12.2015833
Autor:
Fabrizio Evangelista, Emilien Feuillet, Arun Kumar Gnanappa, Nina Vladimirovna Dziomkina, Michel Riepen, Evangelos Gogolides
Publikováno v:
SPIE Proceedings.
Failure of the receding meniscus during immersion lithography is one of the well known problems. A thin liquid film left behind on the wafer during scanning may generate imaging defects. Liquid loss occurs at the receding meniscus when the smooth sub
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d377c1f4cc3d4f9fdc0360a549844b0c
https://doi.org/10.1117/12.881605
https://doi.org/10.1117/12.881605