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pro vyhledávání: '"Nina G. Chechik"'
Autor:
David B. James, Quy K. Ong, Michael R. Oliver, Igor M. Sokolov, Hasan Shodiev, Nina G. Chechik
Publikováno v:
Journal of colloid and interface science. 300(2)
Interaction of silica and silicon nitride with polyurethane surfaces is rather poorly studied despite being of great interest for modern semiconductor industry, e.g., for chemical-mechanical planarization (CMP) processes. Here we show the results fro
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::b03f0035c442452a0a8d57042fd55e40
https://pubmed.ncbi.nlm.nih.gov/16678193
https://pubmed.ncbi.nlm.nih.gov/16678193
Publikováno v:
World Tribology Congress III, Volume 2.
The forces of interaction between ceria slurry particles, and polyurethane CMP polishing pads were measured by atomic force microscopy. To measure the forces between the ceria particles and the pads with the AFM, we attached the ceria particles to th
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::29caa7b01821a1bf19c07ca09a6dad9e
https://doi.org/10.1115/wtc2005-64160
https://doi.org/10.1115/wtc2005-64160