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Autor:
S. Grammatikopoulos, Efstathios I. Meletis, A. Vlachos, D. Trachylis, M. J. Velgakis, P.S. Ioannou, Panagiotis Poulopoulos, V. Karoutsos, Nikolaos Bebelos, Constantin Politis
Publikováno v:
Journal of Nano Research. 30:68-77
Nickel films are grown by radio frequency magnetron sputtering on Corning glass, polyimide foils and on the native oxide of Si (100) wafers at low (1x10-3 mbar) and relatively high (2.5x10-2 mbar) Argon pressure at 100 °C. The base pressure of the h