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Autor:
Liudmila V. Baran, Aleksandr A. Shevchenok, Anatoly G. Karoza, Aleksandr N. Chumakov, Victoria V. Malutina-Bronskaya, Aliaxei A. Ivanov, Nikolai A. Bosak
Publikováno v:
Journal of the Belarusian State University. Physics. :10-18
The thin films deposited in vacuum (2 ⋅ 10–2 mm Hg) on the silicon and glass substrates under the multi-pulse high-frequency (10 –15 kHz) laser exposure (laser radiation power density 100 MW/cm2 and the distance from the target to the substrate
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::627cd7147221fd76ba4bc3cda485e7b0
https://doi.org/10.33581/2520-2243-2020-2-10-18
https://doi.org/10.33581/2520-2243-2020-2-10-18
