Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Nikolai A. Andrianov"'
Autor:
Artem A. Osipov, Nikolai A. Andrianov, Anastasia B. Speshilova, Alina E. Gagaeva, Sarah Risquez, Alexandr Vorobyev, Sergey E. Alexandrov
Publikováno v:
Plasma Chemistry and Plasma Processing. 43:697-707
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a9a7e53f2c98d7f39d700eea4d629e2b
https://doi.org/10.1007/s11090-023-10318-x
https://doi.org/10.1007/s11090-023-10318-x
Autor:
A. S. Smirnov, Yuri Barsukov, Vladimir Volynets, Nikolai A. Andrianov, Alexander V. Tulub, A. A. Kobelev
Publikováno v:
Journal of Vacuum Science & Technology A. 36:061301
Dry etching of silicon nitride (SiN) is a challenging process in the semiconductor industry and requires high etch selectivity. Fluorine containing chemistry is widely used to etch silicon based materials, and one of the methods to increase the etch
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9f7665e340f767a376247efdd6470175
https://doi.org/10.1116/1.5044647
https://doi.org/10.1116/1.5044647