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pro vyhledávání: '"Nikhill M. Tiwale"'
Autor:
Aditya Raja Gummadavelly, Chang-Yong Nam, Nikhill M. Tiwale, Jiyoung Kim, Jean François Veyan, Su Min Hwang, Dan N. Le, Jinho Ahn, Yong Chan Jung
Publikováno v:
International Conference on Extreme Ultraviolet Lithography 2021.
Significant efforts have been dedicated to the development of inorganic-organic hybrid materials for next-generation EUV resists. Among the various synthesis, vapor-phase infiltration of metal source into existing e-beam photoresists using ALD proces
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::98e9528deb5d8a5e7392a85f0dffa072
https://doi.org/10.1117/12.2601033
https://doi.org/10.1117/12.2601033
